Study on the synergistic effect of electrical bias and proton irradiation on the electrical performance degradation of <b> <i>β</i> </b> -Ga2O3 Schottky barrier diodes

S Shaozhong Yue (Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,) H Huiping Zhu (Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,) L Lei Shu J Jingyao Su (Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,) T Tiexin Zhang (Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,) S Siyuan Chen L Lei Wang X Xinyi Zhang J Jianhui Bu (Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,) B Bo Li

Abstract

In this work, the synergistic effect of 5 MeV proton irradiation and different biases on the electrical performance of a β-Ga2O3 Schottky barrier diode was studied. Experimental results demonstrate that proton irradiation leads to significant degradation in electrical performance with increasing proton fluence, manifested as decreased forward current density, reduced reverse current density, and increased breakdown voltage. Based on deep-level transient spectroscopy and capacitance–voltage measurements, the degradation is attributed to the introduction of an electron trap at the energy level of EC-0.75 eV (gallium vacancy-related defect) within the drift layer during irradiation. Furthermore, the introduction of an off-state bias during proton irradiation results in more severe degradation of the electrical performance of the device relative to the case of proton irradiation without bias. Molecular dynamics simulations and theoretical analysis reveal that this enhancement in degradation is attributed to the applied electric field that suppresses the recombination of gallium vacancies–interstitial atoms and elevates the energy of low-energy secondary particles, thereby promoting the formation of gallium vacancy-related defects.

Article Details

Volume / Issue Vol. 128, Issue 19
Published May 11, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (10)

S

Shaozhong Yue

Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,

H

Huiping Zhu

Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,

L

Lei Shu

J

Jingyao Su

Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,

T

Tiexin Zhang

Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,

S

Siyuan Chen

L

Lei Wang

X

Xinyi Zhang

J

Jianhui Bu

Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,

B

Bo Li