High-mobility AlGaN/GaN heterostructures directly grown on diamond (111) substrates using a high-temperature physical-vapor-deposition AlN nucleation layer

H Hongcai Yang (State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, Nano-optoelectronics Frontier Center of Ministry of Education, School of Physics, Peking University 1 , Beijing 100871,) X Xuelin Yang H Han Yang K Kexin Zhang (State Key Laboratory of High Pressure and Superhard Materials, College of Physics) Z Zhenghao Chen J Junkang Wu (State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, Nano-optoelectronics Frontier Center of Ministry of Education, School of Physics, Peking University 1 , Beijing 100871,) X Xingyu Fu (School of Integrated Circuits, Peking University 1 , Beijing 100871,) F Faquan Wu X Xuan Liu (School of Energy and Power Engineering) Y Yuxia Feng (College of Microelectronics, Beijing University of Technology 2 , Beijing 100124,) X Xing Zhang (State Key Laboratory of Elemento-Organic Chemistry, Frontiers Science Center for New Organic Matter, College of Chemistry) Y Yue Wang X Xiangning Kang (State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, Nano-optoelectronics Frontier Center of Ministry of Education, School of Physics, Peking University 1 , Beijing 100871,) G Guangxu Ju (State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, Nano-optoelectronics Frontier Center of Ministry of Education, School of Physics, Peking University 1 , Beijing 100871,) F Fujun Xu (State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University 1 , Beijing 100871,) N Ning Tang X Xinqiang Wang (Department of Epidemiology and Biostatistics, School of Public Health, Tongji Medical College, Huazhong University of Science and Technology) B Bo Shen (Department of Chemistry)

Abstract

The direct epitaxial growth of GaN on diamond substrates offers a fundamental solution for thermal management in high-power-density GaN electronic devices. However, the amorphous layer and the strong C-C bonds on the diamond (111) surface have persistently hindered high-quality III-nitride nucleation. In this work, we overcome this fundamental challenge through the development of high-temperature physical-vapor-deposited AlN (HT-PVD-AlN) nucleation technology. Our approach utilizes high temperatures to eliminate amorphous layers while employing high-energy plasma species to modify diamond surface bonds, resulting in an AlN nucleation layer with exceptional in-plane and out-of-plane crystallographic alignment. On top of this high-quality PVD-AlN nucleation layer, low-dislocation density GaN layers and high-mobility AlGaN/GaN heterostructures have been fabricated. The full width at half maximum values of the x-ray diffraction rocking curves for the GaN (0002) and (10 1¯ 2) planes are 651 and 788 arcsec, respectively. The AlGaN/GaN heterostructures grown on diamond substrates exhibit a record room-temperature electron mobility of 1640 cm2/(V s). This work demonstrates that GaN directly grown on diamond (111) by employing HT-PVD-AlN nucleation layer is promising for next-generation high-performance GaN electronic devices.

Article Details

Volume / Issue Vol. 128, Issue 8
Published February 23, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (18)

H

Hongcai Yang

State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, Nano-optoelectronics Frontier Center of Ministry of Education, School of Physics, Peking University 1 , Beijing 100871,

X

Xuelin Yang

H

Han Yang

K

Kexin Zhang

State Key Laboratory of High Pressure and Superhard Materials, College of Physics

Z

Zhenghao Chen

J

Junkang Wu

State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, Nano-optoelectronics Frontier Center of Ministry of Education, School of Physics, Peking University 1 , Beijing 100871,

X

Xingyu Fu

School of Integrated Circuits, Peking University 1 , Beijing 100871,

F

Faquan Wu

X

Xuan Liu

School of Energy and Power Engineering

Y

Yuxia Feng

College of Microelectronics, Beijing University of Technology 2 , Beijing 100124,

X

Xing Zhang

State Key Laboratory of Elemento-Organic Chemistry, Frontiers Science Center for New Organic Matter, College of Chemistry

Y

Yue Wang

X

Xiangning Kang

State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, Nano-optoelectronics Frontier Center of Ministry of Education, School of Physics, Peking University 1 , Beijing 100871,

G

Guangxu Ju

State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, Nano-optoelectronics Frontier Center of Ministry of Education, School of Physics, Peking University 1 , Beijing 100871,

F

Fujun Xu

State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University 1 , Beijing 100871,

N

Ning Tang

X

Xinqiang Wang

Department of Epidemiology and Biostatistics, School of Public Health, Tongji Medical College, Huazhong University of Science and Technology

B

Bo Shen

Department of Chemistry