Gate-length scaling of AlGaN/GaN HEMTs for cryogenic low-noise operation

M Mohamed Aniss Mebarki (Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,) F Ferrand Drake Del Castillo Ragnar (Department of Microtechnology and Nanoscience, Chalmers University of Technology 2 , Gothenburg,) F François Joint (Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,) D Denis Meledin (Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,) E Erik Sundin (Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,) M Mattias Thorsell (Department of Microtechnology and Nanoscience, Chalmers University of Technology 2 , Gothenburg,) N Niklas Rorsman (Department of Microtechnology and Nanoscience, Chalmers University of Technology 2 , Gothenburg,) V Victor Belitsky (Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,) V Vincent Desmaris (Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,)

Abstract

This work investigates gate-length (LG) scaling of AlGaN/GaN high electron mobility transistors (HEMTs) for cryogenic low-noise radio frequency (RF) operation at 4 K, targeting applications in radio astronomy receivers and quantum readout front ends. Devices with LG ranging from 1 down to 0.15 μm are characterized and analyzed using a delay-time framework to connect transport dynamics to RF and noise performance. The shortest gate tested device achieves a minimum noise temperature (Tmin) of 6 K at 5 GHz at 4 K, representing approximately an order of magnitude improvement compared to room temperature operation (300 K). The analysis indicates that enhanced effective electron velocity and reduced access resistances drive the observed improvements in RF and noise performance with both LG downscaling and cryogenic cooling while also revealing a growing influence of short-channel effects and parasitics at cryogenic temperatures. These results provide practical design guidelines for pushing GaN HEMTs toward lower noise through continued scaling and targeted optimization of access and contact resistances.

Article Details

Volume / Issue Vol. 128, Issue 17
Published April 27, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (9)

M

Mohamed Aniss Mebarki

Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,

F

Ferrand Drake Del Castillo Ragnar

Department of Microtechnology and Nanoscience, Chalmers University of Technology 2 , Gothenburg,

F

François Joint

Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,

D

Denis Meledin

Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,

E

Erik Sundin

Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,

M

Mattias Thorsell

Department of Microtechnology and Nanoscience, Chalmers University of Technology 2 , Gothenburg,

N

Niklas Rorsman

Department of Microtechnology and Nanoscience, Chalmers University of Technology 2 , Gothenburg,

V

Victor Belitsky

Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,

V

Vincent Desmaris

Group for Advanced Receiver Development (GARD), Department of Space, Earth, and Environment, Chalmers University of Technology 1 , Gothenburg,