3.89-kV AlGaN/GaN Schottky barrier diodes on silicon substrate with BaTiO3 field plate termination

X Xiancheng Liu (Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University , Jiangsu, Nanjing 210093,) R Ru Xu (Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University , Jiangsu, Nanjing 210093,) N Na Sun J Jiahao Yao T Tong Xu J Jinyu Lu T Tianhao Niu (Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University , Jiangsu, Nanjing 210093,) D Dunjun Chen Z Zili Xie J Jiandong Ye (School of Electronic Science and Engineering, Nanjing University 2 , Nanjing 210023,) X Xiangqian Xiu (Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University , Jiangsu, Nanjing 210093,) Y Yi Shi (School of Materials Science and Engineering, Key Laboratory for Polymeric Composite and Functional Materials of Ministry of Education, Guangdong Functional Biomaterials Engineering Technology Research Center) R Rong Zhang (Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong 999077, China) Y Youdou Zheng (School of Electronic Science and Engineering, Nanjing University 2 , Nanjing 210023,) P Peng Chen

Abstract

This Letter demonstrates a high breakdown voltage (VBK) lateral AlGaN/GaN Schottky barrier diode (SBD) on Si substrate. Using the high-permittivity material BaTiO3 in a field plate structure provides the benefit of lowering the peak surface electric field from 2.9 to 1.9 MV/cm and improving VBK from 3.22 to 3.89 kV, when the anode–cathode distance (LAC) is 30 μm. Accompanied with a specific on-resistance (Rsp,on) of 3.89 mΩ cm2, the AlGaN/GaN SBD on Si substrate achieved a power figure-of-merit as high as 3.89 GW/cm2, indicating superior potential application in medium- to high-power devices.

Article Details

Volume / Issue Vol. 128, Issue 4
Published January 26, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (15)

X

Xiancheng Liu

Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University , Jiangsu, Nanjing 210093,

R

Ru Xu

Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University , Jiangsu, Nanjing 210093,

N

Na Sun

J

Jiahao Yao

T

Tong Xu

J

Jinyu Lu

T

Tianhao Niu

Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University , Jiangsu, Nanjing 210093,

D

Dunjun Chen

Z

Zili Xie

J

Jiandong Ye

School of Electronic Science and Engineering, Nanjing University 2 , Nanjing 210023,

X

Xiangqian Xiu

Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University , Jiangsu, Nanjing 210093,

Y

Yi Shi

School of Materials Science and Engineering, Key Laboratory for Polymeric Composite and Functional Materials of Ministry of Education, Guangdong Functional Biomaterials Engineering Technology Research Center

R

Rong Zhang

Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong 999077, China

Y

Youdou Zheng

School of Electronic Science and Engineering, Nanjing University 2 , Nanjing 210023,

P

Peng Chen