Very high Curie temperature (470–530 K) in (Ga,Fe)Sb ferromagnetic semiconductor grown by step-flow mode on vicinal GaAs substrates

P Pham Nam Hai (Department of Electrical and Electronic Engineering, Institute of Science Tokyo 1 , Tokyo 152-8550,) K Ken Takabayashi (Department of Electrical and Electronic Engineering, Tokyo Institute of Technology 1 , 2-12-1 Ookayama, Meguro, Tokyo 152-0033,) K Kota Ejiri (Department of Electrical and Electronic Engineering, Institute of Science Tokyo 1 , 2-12-1 Ookayama, Meguro, Tokyo 152-8550,) M Masaaki Tanaka (Department of Electrical Engineering & Information Systems, The University of Tokyo 2 , 7-3-1 Hongo, Bunkyo, Tokyo 113-8656,)

Abstract

Narrow-gap Fe-doped III–V ferromagnetic semiconductors (FMSs), such as (In,Fe)Sb, (Ga,Fe)Sb, and (In,Fe)Sb, are promising candidates for active semiconductor spintronic devices thanks to their high Curie temperature (TC). In this work, we show that by growing (Ga,Fe)Sb thin films by the step-flow mode on vicinal GaAs (100) substrates with a high off-angle of 10°, we can achieve high-quality (Ga0.76,Fe0.24)Sb FMS with TC as high as 470–530 K, which are the highest TC reported so far for FMSs. The magnetic moment of Fe atoms in our sample reaches 4.5 μB/atom, which is close to the ideal magnetic moment of substitutional Fe3+ atoms (5 μB/atom) in a zinc blende crystal structure, and is twice that of α-Fe metal. Our work establishes a growth technique of very high TC FMSs for room-temperature semiconductor spintronic devices.

Article Details

Volume / Issue Vol. 126, Issue 16
Published April 21, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (4)

P

Pham Nam Hai

Department of Electrical and Electronic Engineering, Institute of Science Tokyo 1 , Tokyo 152-8550,

K

Ken Takabayashi

Department of Electrical and Electronic Engineering, Tokyo Institute of Technology 1 , 2-12-1 Ookayama, Meguro, Tokyo 152-0033,

K

Kota Ejiri

Department of Electrical and Electronic Engineering, Institute of Science Tokyo 1 , 2-12-1 Ookayama, Meguro, Tokyo 152-8550,

M

Masaaki Tanaka

Department of Electrical Engineering & Information Systems, The University of Tokyo 2 , 7-3-1 Hongo, Bunkyo, Tokyo 113-8656,