Varistructure resistive switching memory devices through dynamical redox of oxides

H Hao-Nan Li L Lei Wang J Jiang Zhu Y Yi-Xing He (State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,) X Xian-Qin Liu (State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,) Y Yue-Qi Wang (State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,) S Siwen Zhang J Jia-Yu Wang (State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,) S Shu-Ming Zhao (State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,) Y Yong-Qi Zhou (State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,) H Haijiao Harsan Ma (State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,) Y Yue Hao J Jincheng Zhang

Abstract

Hafnium oxide-based resistive switching (RS) devices are promising candidates for next-generation nonvolatile memories because of their ability to integrate into silicon electronics. However, irreversible and unidirectional movements of oxygen vacancies in functional oxide in memristors limit the improvement of ON/OFF ratio and endurance simultaneously as well as the highest working temperature up to 300 °C. Here, we design varistructure RS devices through oxygen vacancy engineering and dynamical redox of Ta. The ON/OFF ratio and the endurance are largely co-improved due to dynamical redox of Ta at the interfaces. Compared to all current RS memories, it cumulatively demonstrates high endurance (105), retention (104 s), ON/OFF ratio (104–106), operation speed (75 ns), and low write voltage (2 V). Remarkably, the RS devices remain stable up to 300 °C.

Article Details

Volume / Issue Vol. 128, Issue 1
Published January 05, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (13)

H

Hao-Nan Li

L

Lei Wang

J

Jiang Zhu

Y

Yi-Xing He

State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,

X

Xian-Qin Liu

State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,

Y

Yue-Qi Wang

State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,

S

Siwen Zhang

J

Jia-Yu Wang

State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,

S

Shu-Ming Zhao

State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,

Y

Yong-Qi Zhou

State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,

H

Haijiao Harsan Ma

State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , 2 South Taibai Road, Xi'an 710071,

Y

Yue Hao

J

Jincheng Zhang