Valence equivalence guided high-throughput search for stable monolayer MA2Z4 and M2A2Z4

M Meiyi Chen Z Zhineng Zhang (Key Laboratory of Flexible Electronics (KLOFE) and Institute of Advanced Materials (IAM), School of Flexible Electronics (Future Technologies), Nanjing Tech University (NanjingTech) 2 , Nanjing,) J Jingyi Wang K Keying Han C Congpu Mu (Key Laboratory for Microstructural Material Physics of Hebei Province, School of Science, Yanshan University 1 , Qinhuangdao 066004,) Y Yingchun Cheng

Abstract

The chemical vapor deposition synthesis of two-dimensional (2D) materials without bulk counterparts, such as MoSi2N4, has opened new avenues for materials design. MoSi2N4 can be viewed as MoS2 in which the S atoms are replaced by SiN2 groups, as both S and the SiN2 group have a −2 valence state. Inspired by this principle, we propose a valence equivalence strategy for designing 2D materials without bulk counterparts. Specifically, we substitute the chalcogenide (X) layers in conventional 2H-MX2 (M = V, Nb, Ta, Cr, Mo, and W), 1T-MX2 (M = Ti, Zr, Hf, and Sn), and α-MX (M = Ga and In) monolayers with AZ2 (A = C, Si, and Ge; Z = N, P, and As) groups. Using high-throughput first-principles calculations, we screened 108 candidate monolayer structures (2H-MA2Z4, 1T-MA2Z4, and α-M2A2Z4), of which 82 are dynamically stable. This result confirms the effectiveness of our design principle. The stable materials exhibit diverse electronic properties, including metals, semimetals, and semiconductors with bandgaps ranging from 0.06 to 3.08 eV. Notably, VSi2As4 and VGe2As4 emerge as promising intrinsic magnetic semiconductors, while the wide-bandgap Ga2Si2N4 shows great potential for efficient photocatalytic overall water splitting. These properties make them potential candidates for applications in spintronics, optoelectronics, and photocatalysis. This work provides a database of predicted novel 2D materials and establishes a general design strategy for future materials discovery.

Article Details

Volume / Issue Vol. 128, Issue 13
Published March 30, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (6)

M

Meiyi Chen

Z

Zhineng Zhang

Key Laboratory of Flexible Electronics (KLOFE) and Institute of Advanced Materials (IAM), School of Flexible Electronics (Future Technologies), Nanjing Tech University (NanjingTech) 2 , Nanjing,

J

Jingyi Wang

K

Keying Han

C

Congpu Mu

Key Laboratory for Microstructural Material Physics of Hebei Province, School of Science, Yanshan University 1 , Qinhuangdao 066004,

Y

Yingchun Cheng