Unusual Fermi-level pinning and Ohmic contact engineering for Janus TMD heterojunctions from an electronegativity perspective

Q Qian Liu Z Zhen Zhu (Academy for Advanced Interdisciplinary Studies) H Hai-Qing Xie (Hunan Provincial Key Laboratory of Flexible Electronic Materials Genome Engineering, School of Physics and Electronic Science, Changsha University of Science and Technology 1 , Changsha 410114,) Z Zhi-Qiang Fan (Hunan Provincial Key Laboratory of Flexible Electronic Materials Genome Engineering, School of Physics and Electronic Science, Changsha University of Science and Technology 1 , Changsha 410114,) D Dan Wu (Key Laboratory of Freshwater Fish Reproduction and Development, Ministry of Education, State Key Laboratory Breeding Base of Eco-Environments and Bio-Resources of the Three Gorges Reservoir Region, School of Life Sciences, Southwest University) K Ke-Qiu Chen (Department of Applied Physics, School of Physics and Electronics, Hunan University 3 , Changsha 410082,)

Abstract

Using density functional theory calculations, we systematically investigated the fat band structures and Schottky barriers of 72 van der Waals heterojunctions (vdWHs) formed by combining 1T-phase transition metal dichalcogenides (TMDs) (MX2, M = Mo, W; X = S, Se, Te) with 2H-phase Janus TMDs (MXY, M = Mo, W; X, Y = S, Se, Te). Unlike conventional TMDs, Janus TMDs lack mirror symmetry and exhibit a built-in in-plane dipole due to their asymmetric atomic configuration. A larger electronegativity gradient across the Janus TMDs leads to enhanced charge redistribution at the vdWH interface and a stronger in-plane dipole, resulting in unusual Fermi-level pinning (FLP). The calculated pinning factors for 1T-TMDs/MoSTe and 1T-TMDs/WSTe vdWHs are particularly low, reflecting a strong FLP effect. Despite the wide variation in work functions among the 1T-TMDs, their Fermi levels are consistently pinned near the band edges of MoSTe and WSTe, enabling quasi-Ohmic or Ohmic p-type and n-type contacts. Furthermore, the vdWHs exhibit low tunneling-specific resistivity, confirming their potential for ultra-low contact resistance applications in next-generation single-layer transistors.

Article Details

Volume / Issue Vol. 127, Issue 9
Published September 01, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (6)

Q

Qian Liu

Z

Zhen Zhu

Academy for Advanced Interdisciplinary Studies

H

Hai-Qing Xie

Hunan Provincial Key Laboratory of Flexible Electronic Materials Genome Engineering, School of Physics and Electronic Science, Changsha University of Science and Technology 1 , Changsha 410114,

Z

Zhi-Qiang Fan

Hunan Provincial Key Laboratory of Flexible Electronic Materials Genome Engineering, School of Physics and Electronic Science, Changsha University of Science and Technology 1 , Changsha 410114,

D

Dan Wu

Key Laboratory of Freshwater Fish Reproduction and Development, Ministry of Education, State Key Laboratory Breeding Base of Eco-Environments and Bio-Resources of the Three Gorges Reservoir Region, School of Life Sciences, Southwest University

K

Ke-Qiu Chen

Department of Applied Physics, School of Physics and Electronics, Hunan University 3 , Changsha 410082,