The impact of defect evolution on the electrical performance of AlGaN/GaN HEMT after 14-MeV neutron irradiation

B Baiwei Chen C Chuan Liao (Department of Global Development, Cornell University) S Shaozhong Yue (Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,) C Chao Peng Z Zhangang Zhang (China Electronic Product Reliability and Environmental Testing Research Institute 1 , Guangzhou 510610,) J Jinbin Wang (Department of Agronomy, Purdue University) T Teng Ma H Hongjia Song (National-Provincial Laboratory of Special Function Thin Film Materials, School of Materials Science and Engineering, Xiangtan University 1 , Xiangtan 411105, Hunan,) Z Zhao Fu H Hong Zhang J Jianqun Yang (Technology Innovation Center of Materials and Devices at Extreme Environment, School of Materials Science and Engineering, Harbin Institute of Technology 1 , Harbin 150001,) X Xiuhai Cui Z Zhifeng Lei (China Electronic Product Reliability and Environmental Testing Research Institute 1 , Guangzhou 510610,) X Xiangli Zhong (School of Materials Science and Engineering, Xiangtan University 1 , Xiangtan 411105,) X Xiaoping Ouyang

Abstract

In this work, we study the electrical performance of AlGaN/GaN high-electron-mobility transistors following irradiation with 14 MeV neutrons at fluences of 3 × 1012, 7.4 × 1012, 1.2 × 1013, and 1.0 × 1014 n/cm2. The results reveal that at a neutron fluence of 7.4 × 1012 n/cm2, there is a notable increase in the saturation drain current, a negative shift in threshold voltage, and an enhancement in peak transconductance. As the fluence continues to increase, the electrical characteristics of the device begin to deteriorate. However, at a fluence of 1.0 × 1014 n/cm2, the electrical performance is still better than that before irradiation. The defect evolution induced by neutron irradiation is studied by utilizing low-frequency noise (LFN) and deep-level transient spectroscopy (DLTS) techniques. LFN analysis shows only slight changes in interface state density, while DLTS results reveal a significant reduction in deep-level defects after irradiation. We speculate that bulk defects in the GaN or AlGaN layers predominantly influence device performance variations. Neutron irradiation facilitates the recombination of original defects, thereby decreasing the concentration of deep-level defects in the device. This decrease in deep-level defects alleviates carrier trapping by defects, resulting in an increased carrier concentration and improved electrical performance of the device.

Article Details

Volume / Issue Vol. 126, Issue 22
Published June 02, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (15)

B

Baiwei Chen

C

Chuan Liao

Department of Global Development, Cornell University

S

Shaozhong Yue

Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,

C

Chao Peng

Z

Zhangang Zhang

China Electronic Product Reliability and Environmental Testing Research Institute 1 , Guangzhou 510610,

J

Jinbin Wang

Department of Agronomy, Purdue University

T

Teng Ma

H

Hongjia Song

National-Provincial Laboratory of Special Function Thin Film Materials, School of Materials Science and Engineering, Xiangtan University 1 , Xiangtan 411105, Hunan,

Z

Zhao Fu

H

Hong Zhang

J

Jianqun Yang

Technology Innovation Center of Materials and Devices at Extreme Environment, School of Materials Science and Engineering, Harbin Institute of Technology 1 , Harbin 150001,

X

Xiuhai Cui

Z

Zhifeng Lei

China Electronic Product Reliability and Environmental Testing Research Institute 1 , Guangzhou 510610,

X

Xiangli Zhong

School of Materials Science and Engineering, Xiangtan University 1 , Xiangtan 411105,

X

Xiaoping Ouyang