The chronic degeneration mechanism of NbOx-based artificial neurons in the active state

Q Qian Cheng (The Hong Kong University of Science and Technology , , , ,) G Guokun Ma (Institute of Microelectronics and Integrated Circuits, School of Microelectronics, Hubei University 1 , Wuhan 430062,) A Ao Chen (Institute of Process Equipment, College of Energy Engineering) Z Zhennan Lin (Key Laboratory of Polar Materials and Devices (MOE), and Department of Electronics) J Jinkang Zou (Institute of Microelectronics and Integrated Circuits, School of Microelectronics, Hubei University 1 , Wuhan 430062,) L Liangping Shen (Institute of Microelectronics and Integrated Circuits, School of Microelectronics, Hubei University 1 , Wuhan 430062,) H Houzhao Wan H Hao Wang (Division of Quantitative Sciences, Department of Oncology Johns Hopkins University School of Medicine Baltimore Maryland USA)

Abstract

The stable operation of the neuromorphic system is significantly constrained by the response imbalance of artificial neurons, which originates from the degradation of devices as switching voltage shift (SVS). In this Letter, we systematically investigate the chronic degradation mechanism of the NbOx threshold switching (TS) device in integrate-and-fire (LIF) neurons by sustained operations. The SVS of the device is solidly verified and attributed to the changes of the TS region. Particularly, the biased evolution of the TS region diameter during operation dominates the different SVS in the reverse response. This reveals the irreversible degradation of the devices and neurons and further demonstrates their limited self-repair ability by implementing symmetric pulse stimulation. This work clarifies the SVS mechanism of NbOx-based TS devices in LIF neurons, providing support for extending neuronal lifespan and developing reliable neuron-based hardware.

Article Details

Volume / Issue Vol. 126, Issue 23
Published June 09, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (8)

Q

Qian Cheng

The Hong Kong University of Science and Technology , , , ,

G

Guokun Ma

Institute of Microelectronics and Integrated Circuits, School of Microelectronics, Hubei University 1 , Wuhan 430062,

A

Ao Chen

Institute of Process Equipment, College of Energy Engineering

Z

Zhennan Lin

Key Laboratory of Polar Materials and Devices (MOE), and Department of Electronics

J

Jinkang Zou

Institute of Microelectronics and Integrated Circuits, School of Microelectronics, Hubei University 1 , Wuhan 430062,

L

Liangping Shen

Institute of Microelectronics and Integrated Circuits, School of Microelectronics, Hubei University 1 , Wuhan 430062,

H

Houzhao Wan

H

Hao Wang

Division of Quantitative Sciences, Department of Oncology Johns Hopkins University School of Medicine Baltimore Maryland USA