Tailoring imprint in ferroelectric thin films through substrate work function

Chenyue Hu; Laurent Schlur; Gilles Versini; Thomas Fix; Aziz Dinia; Mircea V. Rastei; Silviu Colis

doi:10.1063/5.0335819

Tailoring imprint in ferroelectric thin films through substrate work function

C Chenyue Hu L Laurent Schlur (Institut de Physique et Chimie des Matériaux de Strasbourg (UMR 7504), Université de Strasbourg, CNRS 1 , 23 rue du Loess, BP 43, F-67034 Strasbourg Cedex 2,) G Gilles Versini (Institut de Physique et Chimie des Matériaux de Strasbourg (UMR 7504), Université de Strasbourg, CNRS 1 , 23 rue du Loess, BP 43, F-67034 Strasbourg Cedex 2,) T Thomas Fix (Laboratoire des Sciences de l'Ingénieur, de l'Informatique et de l'Imagerie (UMR 7357), Université de Strasbourg, CNRS 2 , 23 rue du Loess, BP 20, F-67037 Strasbourg Cedex 2,) A Aziz Dinia (Institut de Physique et Chimie des Matériaux de Strasbourg (UMR 7504), Université de Strasbourg, CNRS 1 , 23 rue du Loess, BP 43, F-67034 Strasbourg Cedex 2,) M Mircea V. Rastei (Institut de Physique et Chimie des Matériaux de Strasbourg (UMR 7504), Université de Strasbourg, CNRS 1 , 23 rue du Loess, BP 43, F-67034 Strasbourg Cedex 2,) S Silviu Colis (Institut de Physique et Chimie des Matériaux de Strasbourg (UMR 7504), Université de Strasbourg, CNRS 1 , 23 rue du Loess, BP 43, F-67034 Strasbourg Cedex 2,)

Abstract

The imprint effect, one of the most critical parameters in ferroelectrics, manifests as an asymmetry in polarization reversal. The precise control of imprint is essential for reliable implementations of ferroelectric materials in many applications. In this study, we demonstrate that imprint can be tuned in Bi2FeCrO6 (BFCO) thin films by changing the nature of the underlying layer. Specifically, BFCO(111) films deposited on Nb-doped SrTiO3 (Nb:STO) and SrRuO3 (SRO) exhibit distinct imprint characteristics. Piezoresponse force microscopy reveals a consistent imprint difference of about 1 V between BFCO/Nb:STO and BFCO/SRO, which correlates with the work function difference between the two substrates. These findings underscore a generalizable mechanism for imprint control in ferroelectric heterostructures and hold particular relevance for applications demanding fine polarization management.

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Article Details

Journal Applied Physics Letters

Volume / Issue Vol. 128, Issue 25

Published June 22, 2026

DOI 10.1063/5.0335819

ISSN 0003-6951

Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (7)

C

Chenyue Hu

L

Laurent Schlur