Synergistic mechanism underlying the enhanced electrical performance of vertical <i>β</i>-Ga2O3 Schottky barrier diodes through proton irradiation and annealing

W Weihao Lin Y Yun Li J Junzheng Gao (College of Physics, Sichuan University 1 , Chengdu 610065,) Z Zhimei Yang (School of Physics, Sichuan University 1 , Chengdu 610065,) M Min Gong M Mingmin Huang (Key Laboratory of microelectronics, College of Physics, Sichuan University 1 , Chengdu 610065,) Y Yuhao Wang (Key Laboratory of Biomedical Polymers-Ministry of Education, College of Chemistry and Molecular Sciences) C Chenglin Liao (College of Physics, Sichuan University 1 , Chengdu 610065,) Y Yao Ma (Department of Chemistry and Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, Fudan University, Shanghai 200433, China) G Gang Xiang

Abstract

This study presents the enhancement of the electrical performance in vertical β-Ga2O3 Schottky barrier diodes (SBDs) through proton irradiation followed by annealing processes, along with the underlying physical mechanisms. Initially, the rectification behavior of these SBDs is significantly degraded following 5 MeV proton irradiation. However, for the device treated post annealing, following irradiation (D1-A500), the carrier concentration (ND) decreases by 72.1%, while the breakdown voltage (BV) increases by 124.5%. Deep level transient spectroscopy analysis reveals an increase in the concentration of acceptor traps, E2* (EC-0.74 eV), and the appearance of a new defect peak, E2 (EC-0.86 eV), attributed to proton irradiation and subsequent annealing. E2 is possibly associated with oxygen antisites (OGaII). Further simulations using technology computer aided design further verify that a reduction in ND improves the BV. Therefore, these findings elucidate the effect of proton irradiation on vertical β-Ga2O3 SBDs and emphasize the recovery of the devices by post-annealing treatment, providing valuable insights for application in radiation environments.

Article Details

Volume / Issue Vol. 127, Issue 1
Published July 07, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (10)

W

Weihao Lin

Y

Yun Li

J

Junzheng Gao

College of Physics, Sichuan University 1 , Chengdu 610065,

Z

Zhimei Yang

School of Physics, Sichuan University 1 , Chengdu 610065,

M

Min Gong

M

Mingmin Huang

Key Laboratory of microelectronics, College of Physics, Sichuan University 1 , Chengdu 610065,

Y

Yuhao Wang

Key Laboratory of Biomedical Polymers-Ministry of Education, College of Chemistry and Molecular Sciences

C

Chenglin Liao

College of Physics, Sichuan University 1 , Chengdu 610065,

Y

Yao Ma

Department of Chemistry and Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, Fudan University, Shanghai 200433, China

G

Gang Xiang