Surface Fermi level tuning in thin epitaxial Bi<i>y</i>Sb2−<i>y</i>Te3−<i>x</i>Se<i>x</i>/Si(111) films

N N. P. Stepina (Rzhanov Institute of Semiconductor Physics SB RAS 1 , 13 Lavrentyeva Ave., Novosibirsk 630090,) V V. A. Golyashov A A. O. Bazhenov (Rzhanov Institute of Semiconductor Physics SB RAS 1 , 13 Lavrentyeva Ave., Novosibirsk 630090,) D D. V. Ishchenko (Rzhanov Institute of Semiconductor Physics SB RAS 4 , 630090 Novosibirsk,) N N. Kumar A A. V. Shumilin (Instituto de Ciencia Molecular, Universitat de València 4 , 46980 Paterna,) O O. E. Tereshchenko

Abstract

The effects of chemical treatment and aging of BiySb2−yTe3−xSex 3D topological insulator (TI) thin films on the surface electronic structure, morphology, and transport properties have been studied. The surface conditions significantly affect the separation between the Dirac point (DP) and the Fermi level, which is evident in both photoemission and magnetotransport measurements and is explained by the band bending. Depending on the Fermi level's position relative to the DP, the contribution of topological surface states to the nonlinear Hall effect can be solely controlled by the antilocalization effect or enhanced by the effect of gap opening. The wide tuning of the surface Fermi level by the surface/interface modification could be utilized in metal–insulator–semiconductor structures based on a TI thin films.

Article Details

Volume / Issue Vol. 126, Issue 22
Published June 02, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (7)

N

N. P. Stepina

Rzhanov Institute of Semiconductor Physics SB RAS 1 , 13 Lavrentyeva Ave., Novosibirsk 630090,

V

V. A. Golyashov

A

A. O. Bazhenov

Rzhanov Institute of Semiconductor Physics SB RAS 1 , 13 Lavrentyeva Ave., Novosibirsk 630090,

D

D. V. Ishchenko

Rzhanov Institute of Semiconductor Physics SB RAS 4 , 630090 Novosibirsk,

N

N. Kumar

A

A. V. Shumilin

Instituto de Ciencia Molecular, Universitat de València 4 , 46980 Paterna,

O

O. E. Tereshchenko