Substrate-induced interfacial interactions in MOCVD-grown monolayer MoSe2

C Chao Zhang T Tianyu Hou (Department of General Education, Army Engineering University of PLA 2 , Nanjing 211101,) T Tao Sang (National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials and Collaborative Innovation Center of Advanced Microstructures, Nanjing University 3 , Nanjing 210023,) L Lintao Li W Wei Lyu Y Yunrui Song Z Zhujuan Li (National Laboratory of Solid State Microstructure, School of Physics, Nanjing University 1 , Nanjing 210093,) R Renwei Jing (School of Materials Science and Engineering Jiangsu University of Science and Technology Zhenjiang 212003 P.R. China) Q Qiang Zhang Y Yi Zhang C Chengbing Qin Y Yufeng Hao

Abstract

Transition metal dichalcogenides (TMDCs) have garnered considerable interest for next-generation optoelectronic applications. However, the atomically thin properties of TMDCs make them highly sensitive to the environment. Therefore, the substrate becomes a key ingredient that affects the film growth and properties. In this work, we investigate the interactions between metal organic chemical vapor deposition-grown monolayer MoSe2 and substrates by spectroscopic analyses and theoretical calculations. It is shown that, during the growth process, there is an ∼1% tensile strain between MoSe2 and the substrate owing to the thermal coefficient of expansion mismatch, which leads to a redshift of peak positions in both photoluminescence (PL) and Raman spectra. Furthermore, after transferring monolayer MoSe2 films to sapphire and SiO2/Si substrates, we found that the strong substrate-dependent charge transfer results in different ratios of various excitonic emission intensities by analyzing the temperature-dependent PL spectra and x-ray photoelectron spectroscopy. Our findings reveal strong surface-dependent interactions between TMDC films and their substrates that affect the growth and optical properties of the films, which shed light on the selection of substrates during atomically thin TMDC film growth.

Article Details

Volume / Issue Vol. 126, Issue 26
Published June 30, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (12)

C

Chao Zhang

T

Tianyu Hou

Department of General Education, Army Engineering University of PLA 2 , Nanjing 211101,

T

Tao Sang

National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials and Collaborative Innovation Center of Advanced Microstructures, Nanjing University 3 , Nanjing 210023,

L

Lintao Li

W

Wei Lyu

Y

Yunrui Song

Z

Zhujuan Li

National Laboratory of Solid State Microstructure, School of Physics, Nanjing University 1 , Nanjing 210093,

R

Renwei Jing

School of Materials Science and Engineering Jiangsu University of Science and Technology Zhenjiang 212003 P.R. China

Q

Qiang Zhang

Y

Yi Zhang

C

Chengbing Qin

Y

Yufeng Hao