Study of electronic band alignment in SiGeSn/GeSn quantum well via internal photoemission effect

J Justin Rudie (Material Science and Engineering Program, University of Arkansas 1 , Fayetteville, Arkansas 72701,) H Huong Tran (Department of Electrical Engineering and Computer Science, University of Arkansas 2 , Fayetteville, Arkansas 72701,) Y Yang Zhang S Sylvester Amoah (Department of Electrical Engineering and Computer Science, University of Arkansas 2 , Fayetteville, Arkansas 72701,) S Sudip Acharya (Materials Science and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,) H Hryhorii Stanchu (Institute for Nanoscience and Engineering, University of Arkansas 4 , Fayetteville, Arkansas 72701,) M Mansour Mortazavi (Division of Research, Innovation and Economic Development University of Arkansas at Pine Bluff 4 , 1200 N. University Drive, Pine Bluff, Arkansas 71601,) T Timothy A. Morgan (Naval Surface Warfare Center 5 , Electro-Optics Tech. Div. 300 Highway 361, Crane, Indiana 47522,) G Gregory T. Forcherio (Naval Surface Warfare Center 5 , Electro-Optics Tech. Div. 300 Highway 361, Crane, Indiana 47522,) G Greg Sun (Naval Surface Warfare Center 5 , Electro-Optics Tech. Div. 300 Highway 361, Crane, Indiana 47522,) G Gregory Salamo (Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,) W Wei Du (Department of Urological Surgery Zhujiang Hospital Southern Medical University Guangzhou China) S Shui-Qing Yu (Department of Electrical Engineering and Computer Science, University of Arkansas 2 , Fayetteville, Arkansas 72710,)

Abstract

SiGeSn-based optoelectronic devices, which operate across a broad infrared wavelength range, have garnered significant attention. Among these, heterostructures incorporating quantum wells are particularly promising due to their enhanced carrier confinement. In such structures, the type of band alignment and the associated barrier heights are critical parameters, directly influencing device performance. In this work, we employ internal photoemission measurements to extract the effective barrier heights in a Si0.024Ge0.892Sn0.084/Ge0.882Sn0.118 single quantum well, which is pseudomorphically grown on a Ge0.9Sn0.1 buffer atop a Ge buffered Si substrate. The extracted effective barrier heights are approximately 22 ± 2 meV for electrons and 50 ± 2 meV for holes. Additionally, based on the IPE threshold energy of 555 ± 1 meV, we have experimentally identified a type-I band alignment between the GeSn well and SiGeSn barrier layers—an important finding for the design of efficient infrared photonic devices.

Article Details

Volume / Issue Vol. 127, Issue 3
Published July 21, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (13)

J

Justin Rudie

Material Science and Engineering Program, University of Arkansas 1 , Fayetteville, Arkansas 72701,

H

Huong Tran

Department of Electrical Engineering and Computer Science, University of Arkansas 2 , Fayetteville, Arkansas 72701,

Y

Yang Zhang

S

Sylvester Amoah

Department of Electrical Engineering and Computer Science, University of Arkansas 2 , Fayetteville, Arkansas 72701,

S

Sudip Acharya

Materials Science and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,

H

Hryhorii Stanchu

Institute for Nanoscience and Engineering, University of Arkansas 4 , Fayetteville, Arkansas 72701,

M

Mansour Mortazavi

Division of Research, Innovation and Economic Development University of Arkansas at Pine Bluff 4 , 1200 N. University Drive, Pine Bluff, Arkansas 71601,

T

Timothy A. Morgan

Naval Surface Warfare Center 5 , Electro-Optics Tech. Div. 300 Highway 361, Crane, Indiana 47522,

G

Gregory T. Forcherio

Naval Surface Warfare Center 5 , Electro-Optics Tech. Div. 300 Highway 361, Crane, Indiana 47522,

G

Greg Sun

Naval Surface Warfare Center 5 , Electro-Optics Tech. Div. 300 Highway 361, Crane, Indiana 47522,

G

Gregory Salamo

Institute for Nanoscience and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,

W

Wei Du

Department of Urological Surgery Zhujiang Hospital Southern Medical University Guangzhou China

S

Shui-Qing Yu

Department of Electrical Engineering and Computer Science, University of Arkansas 2 , Fayetteville, Arkansas 72710,