Structural and electrical properties of fiber textured and epitaxial molybdenum thin films prepared by magnetron sputter epitaxy

Abstract

Molybdenum (Mo) due to its optimal structural, physical, and acoustic properties finds application as electrode material in aluminum scandium nitride and aluminum nitride (AlN) based bulk acoustic wave (BAW) resonators. Epitaxial Mo thin films exhibiting low resistivity can improve the performance of the BAW resonator by enhancing both the electro-mechanical coupling coefficient (keff2) and quality factor Q. In this study, we systematically vary the growth temperature of Mo grown on fiber-textured and epitaxial wurtzite-aluminum nitride (AlN) to study the changes in structural and electrical properties of the Mo films. Results show that Mo grown at 700 °C on epitaxial AlN exhibits low surface roughness (Rq = 0.8 nm), large average grain diameter (dgrain = 330 nm), low resistivity (ρ=6.6 ± 0.06  μΩ cm), and high crystal quality (XRD Mo 110 ω-FWHM = 0.63°). XRD pole figure and ϕ-scan analysis reveal that irrespective of the growth temperature, Mo is fiber textured on fiber-textured AlN and has three rotational domains on epitaxial AlN. This study shows that the resistivity of Mo reduces with increasing growth temperature, which we relate to increasing average grain diameter. Additionally, we show that fiber-textured Mo has more high angle grain boundaries resulting in consistently higher resistivity than its epitaxial equivalent.