Spin accumulation based deep MOKE microscopy

J J. C. Rodriguez E. (Instituto de Nanociencia y Nanotecnología (CNEA-CONICET) 1 , Nodo Bariloche, Av. Bustillo 9500, 8400 S. C. de Bariloche (RN),) H H. Grisk (Université de Lorraine, CNRS, IJL 4 , Nancy F-54000,) A A. Anadón (Institute of Applied Physics, TU Wien 1 , 1040 Vienna,) H H. Singh (Université de Lorraine, CNRS, IJL 4 , Nancy F-54000,) G G. Malinowski (Université de Lorraine, CNRS, IJL 4 , Nancy F-54000,) M M. Hehn (Institut Jean Lamour (UMR CNRS 7198), Université Lorraine 7 , 54000 Nancy,) J J. Curiale (Instituto de Nanociencia y Nanotecnología (CNEA-CONICET) 1 , Nodo Bariloche, Av. Bustillo 9500, 8400 S. C. de Bariloche (RN),) J J. Gorchon (Université de Lorraine, CNRS, IJL 4 , Nancy F-54000,)

Abstract

Magnetic imaging techniques are widespread critical tools used in fields such as magnetism, spintronics, or even superconductivity. Among them, one of the most versatile methods is the magneto-optical Kerr effect. However, as soon as light is blocked from interacting with the magnetic layer, such as in deeply buried layers, optical techniques become ineffective. In this work, we present a spin accumulation based magneto-optical Kerr effect microscopy technique that enables imaging of a magnetic thin-film covered by thick and opaque metallic layers. The technique is based on the generation and detection of transient spin accumulations that propagate through the thick metallic layer. These spin accumulation signals are directly triggered and detected optically on the same side, lifting any substrate transparency requirements. The spin accumulation signals detected on a Cu layer decay with a characteristic length of 60 nm, much longer than the 12 nm optical penetration depth, allowing for the detection of magnetic contrast with Cu capping layers up to hundreds of nm. This method should enable magnetic imaging in a wide range of experiments where the surface of interest is covered by electrodes.

Article Details

Volume / Issue Vol. 128, Issue 6
Published February 09, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (8)

J

J. C. Rodriguez E.

Instituto de Nanociencia y Nanotecnología (CNEA-CONICET) 1 , Nodo Bariloche, Av. Bustillo 9500, 8400 S. C. de Bariloche (RN),

H

H. Grisk

Université de Lorraine, CNRS, IJL 4 , Nancy F-54000,

A

A. Anadón

Institute of Applied Physics, TU Wien 1 , 1040 Vienna,

H

H. Singh

Université de Lorraine, CNRS, IJL 4 , Nancy F-54000,

G

G. Malinowski

Université de Lorraine, CNRS, IJL 4 , Nancy F-54000,

M

M. Hehn

Institut Jean Lamour (UMR CNRS 7198), Université Lorraine 7 , 54000 Nancy,

J

J. Curiale

Instituto de Nanociencia y Nanotecnología (CNEA-CONICET) 1 , Nodo Bariloche, Av. Bustillo 9500, 8400 S. C. de Bariloche (RN),

J

J. Gorchon

Université de Lorraine, CNRS, IJL 4 , Nancy F-54000,