Spectroscopic imaging- and micro-ellipsometry of MXene-based microelectronic devices

A Andreas Furchner (Helmholtz‐Zentrum Berlin für Materialien und Energie GmbH Albert‐Einstein‐Straße 15 12489 Berlin Germany) R Ralfy Kenaz (Racah Institute of Physics The Hebrew University of Jerusalem Jerusalem 9190401 Israel) B Bar Favelukis (Department of Materials Science and Engineering, Tel Aviv University 3 , P. O. B 39040, Ramat Aviv 6997801,) M Maxim Sokol (Department of Materials Science and Engineering, Tel Aviv University 3 , P. O. B 39040, Ramat Aviv 6997801,) R Ronen Rapaport (Racah Institute of Physics, The Hebrew University of Jerusalem 2 , Jerusalem 9190401,) T Tristan Petit

Abstract

MXenes are two-dimensional (2D) nanomaterials whose optical, structural, and charge-transport properties can be finely tuned through composition and surface chemistry. MXetronics builds on this tunability to develop microscale electronic and photonic devices based on MXene thin films. Here, we demonstrate that imaging spectroscopic ellipsometry (ISE) and spectroscopic micro-ellipsometry (SME) provide two complementary, fully non-invasive optical approaches for characterization and process control of MXene-based comb-shaped backside electrodes used in photodetector and gas-sensing applications. SME enables sub-minute high-throughput probing of multiple representative sample sites, offering rapid assessment of fabrication quality. ISE delivers device-scale or micrometer-resolved imaging, allowing precise visualization of MXene film uniformity, structural integrity, composition, and transport-related properties throughout device processing. Leveraging SME's and ISE's high sensitivity toward these properties, we show that electrode regions altered during photoresist lithography are readily identified by their increased thickness, reduced conductivity, and distinct optical fingerprints, arising from tetramethylammonium hydroxide (TMAOH) intercalation into Ti3C2Tx. These results represent the comprehensive application of microscopic ellipsometry techniques to MXene microsystems, establishing a powerful metrology pathway for the rapidly growing fields of MXene 2D materials and MXetronics.

Article Details

Volume / Issue Vol. 128, Issue 17
Published April 27, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (6)

A

Andreas Furchner

Helmholtz‐Zentrum Berlin für Materialien und Energie GmbH Albert‐Einstein‐Straße 15 12489 Berlin Germany

R

Ralfy Kenaz

Racah Institute of Physics The Hebrew University of Jerusalem Jerusalem 9190401 Israel

B

Bar Favelukis

Department of Materials Science and Engineering, Tel Aviv University 3 , P. O. B 39040, Ramat Aviv 6997801,

M

Maxim Sokol

Department of Materials Science and Engineering, Tel Aviv University 3 , P. O. B 39040, Ramat Aviv 6997801,

R

Ronen Rapaport

Racah Institute of Physics, The Hebrew University of Jerusalem 2 , Jerusalem 9190401,

T

Tristan Petit