Sn-doping effect on dielectric properties of Ba(Ti1–<i>x</i>Sn<i>x</i>)O3 studied by x-ray absorption and emission spectroscopies
Abstract
Significant enhancements of the dielectric and piezoelectric constants of Ba(Ti1−xSnx)O3 ceramics are of considerable interest in the quest for lead-free alternatives. The Sn-doping effect for x≤0.3 was investigated using x-ray absorption (XAS) and emission (XES) spectroscopy from a microscopic viewpoint. The Ti-K pre-edge XAS peak characteristic of Ti off-center displacement retains its intensity up to x=0.075, indicating the stability of the electric dipole moment at the Ti site, which was also confirmed by the locally sensitive charge-transfer peaks observed in Ti Kβ XES. In contrast, Sn L3-edge XAS shows a monotonic decrease in the characteristic peak intensity in the same x range, which is interpreted as the association of oxygen vacancies with Sn-doping at the Ti site based on the spectral simulation. The response to the electric field of the dipole moment at the Ti site becomes significant with the help of reduced dipole–dipole interaction by inevitably introduced oxygen vacancies, which leads to an enhancement of dielectric properties in the Sn low concentration range.
Article Details
Journal Info
Applied Physics Letters
American Institute of Physics
Authors (7)
Hiroyasu Sakano
Graduate School of Advanced Science and Engineering, Hiroshima University 1 , 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8526,
Nobuo Nakajima
Graduate School of Advanced Science and Engineering, Hiroshima University 1 , 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8526,
Shintaro Noda
Graduate School of Advanced Science and Engineering, Hiroshima University 1 , 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8526,
Eiki Kakihara
Department of Engineering, Graduate School of Integrated Science and Technology, Shizuoka University 2 , Shizuoka,
Desheng Fu
Department of Electronics and Materials Science, Faculty of Engineering and Department of Engineering, Graduate School of Integrated Science and Technology, Shizuoka University 3 , Hamamatsu 432-8561, and , Hamamatsu 432-8011,
Yasuhisa Tezuka
Graduate School of Science and Technology, Hirosaki University 5 , 3 Bunkyo-cho, Hirosaki, Aomori 036-8561,
Toshiaki Iwazumi
Graduate School of Engineering Division of Physics and Electronics, Osaka Metropolitan University 6 , Sakai, Osaka 599-8531,