Simultaneous measurement of charge carrier density, mobility, and their transients with four electrical contacts: Frequency-multiplexed Hall effect method

C Can C. Aygen (Northwestern University 1 Electrical & Computer Engineering, , Evanston, Illinois 60208,) C Christopher Cravey (Northwestern University 2 Program in Applied Physics, , Evanston, Illinois 60208,) J Jiajun Luo (Key Laboratory of Multi-Cell Systems, Shanghai Institute of Biochemistry and Cell Biology, Center for Excellence in Molecular Cell Science, University of Chinese Academy of Sciences, Chinese Academy of Sciences) J James Williams D D. Bruce Buchholz (Department of Materials Science and Engineering, Northwestern University 5 , 2220 Campus Drive, Evanston, Illinois 60208,) D David R. Daughton (Lake Shore Cryotronics 4 , Westerville, Ohio 43082,) C Christian Reichl W Werner Wegscheider M Matthew A. Grayson (Electrical & Computer Engineering)

Abstract

The frequency multiplexed Hall effect method (FMHM) simultaneously measures time-dependent Hall Rxy(t) and longitudinal resistance Rxx(t) in arbitrary shaped samples using only four electrical contacts. FMHM applies the Onsager reciprocity relations along with three independent current sources and three lock-in amplifiers at three different frequencies. Transient FMHM measures samples with time-dependent Rxx(t) and Rxy(t) in the Drude limit at fixed magnetic field B. Parametric FMHM measures Rxx[A(t)] and Rxy[A(t)], where A(t) is an time-dependent control parameter such as B(t) or temperature T(t). Transient FMHM is demonstrated in the Drude regime at fixed magnetic field B to measure photoconductivity transients n(t) and μ(t) in GaN/AlGaN two-dimensional electron systems and on Zn0.3In1.4Sn0.3O3 amorphous oxide thin films. Parametric FMHM is demonstrated both in the Drude regime to study the temperature dependence of persistent photoconductivity n(T) and μ(T) and in the quantum Hall regime to study the magnetic-field dependence of Rxx(B) and Rxy(B) in GaAs quantum wells.

Article Details

Volume / Issue Vol. 126, Issue 24
Published June 16, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (9)

C

Can C. Aygen

Northwestern University 1 Electrical & Computer Engineering, , Evanston, Illinois 60208,

C

Christopher Cravey

Northwestern University 2 Program in Applied Physics, , Evanston, Illinois 60208,

J

Jiajun Luo

Key Laboratory of Multi-Cell Systems, Shanghai Institute of Biochemistry and Cell Biology, Center for Excellence in Molecular Cell Science, University of Chinese Academy of Sciences, Chinese Academy of Sciences

J

James Williams

D

D. Bruce Buchholz

Department of Materials Science and Engineering, Northwestern University 5 , 2220 Campus Drive, Evanston, Illinois 60208,

D

David R. Daughton

Lake Shore Cryotronics 4 , Westerville, Ohio 43082,

C

Christian Reichl

W

Werner Wegscheider

M

Matthew A. Grayson

Electrical & Computer Engineering