Significant negative differential resistance and current limiting effects of cyclo[14]carbon-based molecular devices with graphene electrodes

Y Yang Liu Z Zhihang Fang (State Key Laboratory of Metastable Materials Science & Technology and Key Laboratory for Microstructural Material Physics of Hebei Province, School of Science, Yanshan University , Qinhuangdao 066004,) B Bozong Yao (State Key Laboratory of Metastable Materials Science & Technology and Key Laboratory for Microstructural Material Physics of Hebei Province, School of Science, Yanshan University , Qinhuangdao 066004,) J Jianzhuo Zhu (Key Laboratory for Microstructural Material Physics of Hebei Province, School of Science, Yanshan University 1 , Qinhuangdao 066004,) G Guangjun Tian (State Key Laboratory of Metastable Materials Science & Technology and Hebei Key Laboratory of Microstructural Material Physics, School of Science, Yanshan University 2 , Qinhuangdao 066004,) L Liang Ma

Abstract

Through tip-induced dehalogenation and retro-Bergman ring-opening reaction of fully chlorinated anthanthrene (C14Cl10), the cyclo[14]carbon (C14) was prepared. Owing to its distinctive physical properties, C14 holds the potential to serve as the core unit of functional electronic devices. Herein, the density functional theory combined with the non-equilibrium Green's function technique was used to investigate the electronic transport properties of molecular devices composed of C14 molecules and graphene electrodes, systematically. We find that molecular devices composed of polyynic and cumulenic structures of C14 exhibit a significant negative differential resistance effect and effective current limiting ability at low bias voltages, respectively. Moreover, by calculating and analyzing the transmission function and projected density of states under different biases, a reasonable explanation of those effects is provided.

Article Details

Volume / Issue Vol. 126, Issue 2
Published January 13, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (6)

Y

Yang Liu

Z

Zhihang Fang

State Key Laboratory of Metastable Materials Science & Technology and Key Laboratory for Microstructural Material Physics of Hebei Province, School of Science, Yanshan University , Qinhuangdao 066004,

B

Bozong Yao

State Key Laboratory of Metastable Materials Science & Technology and Key Laboratory for Microstructural Material Physics of Hebei Province, School of Science, Yanshan University , Qinhuangdao 066004,

J

Jianzhuo Zhu

Key Laboratory for Microstructural Material Physics of Hebei Province, School of Science, Yanshan University 1 , Qinhuangdao 066004,

G

Guangjun Tian

State Key Laboratory of Metastable Materials Science & Technology and Hebei Key Laboratory of Microstructural Material Physics, School of Science, Yanshan University 2 , Qinhuangdao 066004,

L

Liang Ma