Revealing the underlying radiation degradation of quantum well solar cells via dynamic bandwidth analysis

M Menglu Yu (School of Nano-Tech and Nano-Bionics, University of Science and Technology of China 1 , Hefei 230026,) H Haowen Hua (School of Nano-Tech and Nano-Bionics, University of Science and Technology of China 1 , Hefei 230026,) Q Qiangjian Sun (Key Laboratory of Semiconductor Display Materials and Chips, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences 2 , Suzhou 215123,) X Xiaoxu Wu (School of Nano-Tech and Nano-Bionics, University of Science and Technology of China 1 , Hefei 230026,) Z Zhitao Chen (School of Nano-Tech and Nano-Bionics, University of Science and Technology of China 1 , Hefei 230026,) Q Qing Gong W Wenhao Miao (Hydrogen Energy Industry Institute of Jilin Province, Changchun Institute of Applied Chemistry) Z Zhenlong Wu (Engineering Research Center for Micro-Nano Optoelectronic Materials and Devices of Ministry of Education, Xiamen University 3 , Xiamen 361005,) J Jianjun Zhu L Lian Ji (Key Laboratory of Semiconductor Display Materials and Chips, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences 2 , Suzhou 215123,) M Min Zhou S Shulong Lu (Key Laboratory of Semiconductor Display Materials and Chips, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences 2 , Suzhou 215123,) J Junhua Long (School of Nano-Tech and Nano-Bionics, University of Science and Technology of China 1 , Hefei 230026,)

Abstract

We propose a dynamic bandwidth characterization strategy to investigate the radiation degradation mechanisms in GaAs quantum well solar cells. Contrary to conventional assumptions that enhanced electric fields restore post-irradiation carrier collection, our high-frequency measurements reveal a significant increase in carrier escape time under reverse bias. This arises from an underlying competing carrier transport mechanism: the radiation-induced carrier removal effect broadens the depletion region, requiring photogenerated carriers to transit a wider region containing a high density of interfacial defects. The resulting increase in capture probability effectively offsets the field-enhanced carrier extraction. These dynamic insights reveal the physical mechanism responsible for the fill factor (FF) degradation and offer critical structural design guidelines for next-generation radiation-hardened space photovoltaics.

Article Details

Volume / Issue Vol. 129, Issue 3
Published July 20, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (13)

M

Menglu Yu

School of Nano-Tech and Nano-Bionics, University of Science and Technology of China 1 , Hefei 230026,

H

Haowen Hua

School of Nano-Tech and Nano-Bionics, University of Science and Technology of China 1 , Hefei 230026,

Q

Qiangjian Sun

Key Laboratory of Semiconductor Display Materials and Chips, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences 2 , Suzhou 215123,

X

Xiaoxu Wu

School of Nano-Tech and Nano-Bionics, University of Science and Technology of China 1 , Hefei 230026,

Z

Zhitao Chen

School of Nano-Tech and Nano-Bionics, University of Science and Technology of China 1 , Hefei 230026,

Q

Qing Gong

W

Wenhao Miao

Hydrogen Energy Industry Institute of Jilin Province, Changchun Institute of Applied Chemistry

Z

Zhenlong Wu

Engineering Research Center for Micro-Nano Optoelectronic Materials and Devices of Ministry of Education, Xiamen University 3 , Xiamen 361005,

J

Jianjun Zhu

L

Lian Ji

Key Laboratory of Semiconductor Display Materials and Chips, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences 2 , Suzhou 215123,

M

Min Zhou

S

Shulong Lu

Key Laboratory of Semiconductor Display Materials and Chips, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences 2 , Suzhou 215123,

J

Junhua Long

School of Nano-Tech and Nano-Bionics, University of Science and Technology of China 1 , Hefei 230026,