Raman analysis of anisotropic strain in semipolar (112¯2) AlN grown on m-plane sapphire

B Bei Ma K Kensei Oya (Department of Electrical and Electronic Engineering, Faculty of Engineering, Mie University 2 , 1577 Kurimamachiya, Tsu,) R Ryota Akaike Y Yoshihiro Ishitani (Department of Electrical and Electronic Engineering, Faculty of Engineering, Chiba University 1 , 1-30 Yayoicho, Inage-ku, Chiba,) H Hideto Miyake

Abstract

The anisotropic strain characteristics of semipolar (112¯2) AlN grown on m-plane sapphire were investigated by Raman spectroscopy and high-resolution x-ray diffraction. The Raman quasi-TO mode exhibited a systematic asymmetry in the line shape, which was quantified by the asymmetry factor β using bi-pseudo-Voigt fitting. XRD analysis of multiple diffraction planes confirmed the presence of anisotropic strain in the films. A monotonic correlation was found between β and the anisotropic strain parameter (εaa−εam) derived from XRD. These results suggest Raman β-factor analysis can serve as a practical, nondestructive indicator of anisotropic strain in semipolar (112¯2) AlN.

Article Details

Volume / Issue Vol. 128, Issue 23
Published June 08, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (5)

B

Bei Ma

K

Kensei Oya

Department of Electrical and Electronic Engineering, Faculty of Engineering, Mie University 2 , 1577 Kurimamachiya, Tsu,

R

Ryota Akaike

Y

Yoshihiro Ishitani

Department of Electrical and Electronic Engineering, Faculty of Engineering, Chiba University 1 , 1-30 Yayoicho, Inage-ku, Chiba,

H

Hideto Miyake