Pressure-dependent photoluminescence study of band structure in germanium

Y Yuanhao Zhu (Center of Quantum Materials and Devices and Department of Physics and Chongqing Key Laboratory for Strongly Coupled Physics, Chongqing University 2 , Chongqing 401331,) X Xiuming Dou (State Key Laboratory of Semiconductor Physics and Chip Technologies, Institute of Semiconductors, Chinese Academy of Sciences 1 , Beijing 100083,) S Shaoteng Wu (State Key Laboratory of Semiconductor Physics and Chip Technologies, Institute of Semiconductors, Chinese Academy of Sciences 1 , Beijing 100083,) L Li He K Kun Ding B Baoquan Sun (Institute of Functional Nano and Soft Materials (FUNSOM) Soochow University Suzhou 215123 China) J Jun-Wei Luo

Abstract

Germanium (Ge) has long been regarded as a promising laser material for silicon photonics due to its quasi-direct bandgap to make up for the deficiency of indirect bandgap silicon, but its energy band structure under pressure remains puzzling. Here, we study the pressure-dependent photoluminescence (PL) of Ge compressed in a diamond anvil cell to reveal its energy band structure up to 3.89 GPa. Unlike the earlier reported results studied by absorption, the effect of high pressure on bandgaps can be studied for the same sample and the determinations of bandgap positions are not influenced by the sample thickness and the interference pattern. The PL peak related to X–Γ bandgap transition was observed with pressure coefficient of −12.4 ± 2.1 meV/GPa. We unambiguously show that the L- and Γ-valleys move upward while the X–valley moves downward in energy with increasing pressure, with a Γ–X crossover observed at an onset pressure of 0.74 GPa, and then a L–X crossover takes place near 2.85 GPa. These findings provide experimental evidence for identification of the band structure of Ge, deepening the understanding of pressure-induced bandgap modification and conduction band valley crossover.

Article Details

Volume / Issue Vol. 128, Issue 2
Published January 12, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (7)

Y

Yuanhao Zhu

Center of Quantum Materials and Devices and Department of Physics and Chongqing Key Laboratory for Strongly Coupled Physics, Chongqing University 2 , Chongqing 401331,

X

Xiuming Dou

State Key Laboratory of Semiconductor Physics and Chip Technologies, Institute of Semiconductors, Chinese Academy of Sciences 1 , Beijing 100083,

S

Shaoteng Wu

State Key Laboratory of Semiconductor Physics and Chip Technologies, Institute of Semiconductors, Chinese Academy of Sciences 1 , Beijing 100083,

L

Li He

K

Kun Ding

B

Baoquan Sun

Institute of Functional Nano and Soft Materials (FUNSOM) Soochow University Suzhou 215123 China

J

Jun-Wei Luo