Penetration of an atmospheric pressure plasma jet into a micro-channel: Forward ionization wave and restrike

H Hao Shang (Shiyan Key Laboratory of Quantum Information and Precision Optics, Hubei Key Laboratory of Energy Storage and Power Battery, School of Optoelectronic Engineering and School of New Energy, Hubei University of Automotive Technology 1 , Shiyan 442002,) Y Yujian Li (MOE Key Laboratory of Laser Life Science & Institute of Laser Life Science, Guangdong Provincial Key Laboratory of Laser Life Science, Guangzhou Key Laboratory of Spectral Analysis and Functional Probes, College of Bio-photonics, School of Optoelectronic Science and Engineering) W Wenjun Ning (College of Electrical Engineering, Sichuan University , Chengdu 610065,) X Xiaolong Huang (Department of Chemistry and Biochemistry) S Saikang Shen (College of Electrical Engineering, Sichuan University , Chengdu 610065,) S Shenli Jia (College of Electrical Engineering, Sichuan University , Chengdu 610065,)

Abstract

In this Letter, we reported both experimental observation and 2D fluid modeling on the penetration of an atmospheric pressure plasma jet into a high-aspect-ratio micro-channel in a dielectric substrate. Two distinguished discharges inside the micro-channel, namely, a forward ionization wave (FIW) and a restrike, were identified by streak images and well predicted by the model. The FIW manifested as a bulk streamer, while the restrike appeared as a surface-hugging discharge that propagated along the charged surface with higher velocity and higher plasma intensity. As such, the restrike could affect the plasma treatment of materials with micro-channels such as fibers and structured catalysts. Our results further revealed the formation of the restrike depended on the applied voltage waveform. Thus, the propagating distance of the restrike could be modulated by the width of the voltage pulse, indicating an effective method to control the plasma dose to the treated samples.

Article Details

Volume / Issue Vol. 127, Issue 25
Published December 22, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (6)

H

Hao Shang

Shiyan Key Laboratory of Quantum Information and Precision Optics, Hubei Key Laboratory of Energy Storage and Power Battery, School of Optoelectronic Engineering and School of New Energy, Hubei University of Automotive Technology 1 , Shiyan 442002,

Y

Yujian Li

MOE Key Laboratory of Laser Life Science & Institute of Laser Life Science, Guangdong Provincial Key Laboratory of Laser Life Science, Guangzhou Key Laboratory of Spectral Analysis and Functional Probes, College of Bio-photonics, School of Optoelectronic Science and Engineering

W

Wenjun Ning

College of Electrical Engineering, Sichuan University , Chengdu 610065,

X

Xiaolong Huang

Department of Chemistry and Biochemistry

S

Saikang Shen

College of Electrical Engineering, Sichuan University , Chengdu 610065,

S

Shenli Jia

College of Electrical Engineering, Sichuan University , Chengdu 610065,