Negative differential resistance in a family of Fe3X4 (X <b>=</b> S, Se, Te) antiferromagnetic semiconducting nanowires

J Jinchao Kang (Key Laboratory of Material Modification by Laser, Ion and Electron Beams (Dalian University of Technology), Ministry of Education 1 , Dalian 116024,) Q Qinxi Liu (Guangdong Basic Research Center of Excellence for Structure and Fundamental Interactions of Matter, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials, School of Physics, South China Normal University 3 , Guangzhou 510006,) X Xue Jiang J Jijun Zhao (Guangdong Basic Research Center of Excellence for Structure and Fundamental Interactions of Matter, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials, School of Physics)

Abstract

The experimentally observed 2D magnets have unlocked the possibility of realizing a stable long-range order in the low-dimensional limit, which also gives a boost to the family of 1D magnets. Recently, a family of Fe-based nanowires has been observed in high-throughput transition metal chalcogenides synthesized by chemical vapor deposition [Zhou et al., Nat. Mater. 22, 450–458 (2023)]. In this work, the atomic configuration, chemical composition, and magnetic properties of Fe3X4 (X = S, Se, Te) nanowires were confirmed by first-principles calculations and Monte Carlo simulations. Due to their intrinsic anisotropic character and strong d-p hybridization, Fe3X4 nanowires exhibit antiferromagnetic semiconducting behavior with good stability, a tunable bandgap of 0.277–0.771 eV, a large vertical magnetic anisotropy energy of 2.39 meV/Fe, and a high Néel temperature of 680–840 K. Moreover, the calculation of the spin transport properties has shown that these Fe3X4 nanowires possess the negative differential resistance behavior with the peak-to-valley current ratio from 1.84 to 6.85. Our results not only expand the database of magnetic nanowires but also provide a low-dimensional platform for multifunctional spin devices.

Article Details

Volume / Issue Vol. 126, Issue 12
Published March 01, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (4)

J

Jinchao Kang

Key Laboratory of Material Modification by Laser, Ion and Electron Beams (Dalian University of Technology), Ministry of Education 1 , Dalian 116024,

Q

Qinxi Liu

Guangdong Basic Research Center of Excellence for Structure and Fundamental Interactions of Matter, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials, School of Physics, South China Normal University 3 , Guangzhou 510006,

X

Xue Jiang

J

Jijun Zhao

Guangdong Basic Research Center of Excellence for Structure and Fundamental Interactions of Matter, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials, School of Physics