Nanoscale carrier distribution and trap dynamics in supported and suspended WSe2 layers studied by scanning nonlinear dielectric microscopy

K Koki Takano (Research Institute of Electrical Communication, Tohoku University 1 , 2-1-1 Katahira, Aoba, Sendai 980-8577,) K Kohei Yamasue T Toshiaki Kato (Graduate School of Engineering, Tohoku University 2 , 6-6-05 Aramaki Aza-Aoba, Aoba, Sendai 980-8579,) Y Yasuo Cho

Abstract

The unique electronic and optical properties of atomically thin transition metal dichalcogenides make them promising candidates for advanced device applications. However, their electrical characteristics are strongly influenced by the interfacial and dielectric environments provided by the substrate. To elucidate these substrate-related properties, microscopy techniques with high spatial resolution are essential. Among these techniques, scanning nonlinear dielectric microscopy (SNDM) has emerged as a powerful tool for visualizing dominant carrier distributions in semiconductor materials. In this study, we employ SNDM to investigate two types of mechanically exfoliated WSe2 samples: one supported on a SiO2 substrate and the other suspended over nanoscale Au wires. Our findings reveal spatial and bias-dependent differences in carrier behavior between the two structures. Specifically, the suspended WSe2 exhibits reduced hysteresis and a more symmetric ambipolar response, consistent with the suppression of charge trapping at interface states. To further probe the fast dynamic responses associated with interface states, we also conduct local deep level transient spectroscopy measurements using time-resolved SNDM.

Article Details

Volume / Issue Vol. 128, Issue 5
Published February 02, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (4)

K

Koki Takano

Research Institute of Electrical Communication, Tohoku University 1 , 2-1-1 Katahira, Aoba, Sendai 980-8577,

K

Kohei Yamasue

T

Toshiaki Kato

Graduate School of Engineering, Tohoku University 2 , 6-6-05 Aramaki Aza-Aoba, Aoba, Sendai 980-8579,

Y

Yasuo Cho