Multifunctional complementary field-effect transistors based on MoS2/SWNTs heterostructures

W Wenxiang Wang (RemeGen, Yantai, China) Z Zheng Wei Y Yong Jun Li J Jiawang You (CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, Nanofabrication Laboratory, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology 2 , Beijing 100190,) X Xiaohuan Li J Jinjin He H Han Mao (CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, Nanofabrication Laboratory, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology 2 , Beijing 100190,) J Jiyou Jin (CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, Nanofabrication Laboratory, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology 2 , Beijing 100190,) L Lianfeng Sun Z Zhaohe Dai

Abstract

The rapid evolution of devices based on low-dimensional materials such as MoS2 and single-walled carbon nanotubes (SWNTs) has garnered significant interest for high-performance field-effect transistor (FET) applications. We present a multifunctional MoS2/SWNT device exhibiting non-monotonic current modulation with a rectifying ratio of up to 600. The device also demonstrates remarkable optoelectronic memory performance, including fast erasing/writing times (20.1/1.9 ms), a high erasing/writing ratio (104), multilevel data storage, robust retention (10 000 s), and excellent endurance (1000 cycles). Additionally, we demonstrate ternary inverters combining SWNTs FETs with MoS2/SWNTs heterostructure FETs, highlighting their potential in advanced logic applications.

Article Details

Volume / Issue Vol. 126, Issue 2
Published January 13, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (10)

W

Wenxiang Wang

RemeGen, Yantai, China

Z

Zheng Wei

Y

Yong Jun Li

J

Jiawang You

CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, Nanofabrication Laboratory, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology 2 , Beijing 100190,

X

Xiaohuan Li

J

Jinjin He

H

Han Mao

CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, Nanofabrication Laboratory, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology 2 , Beijing 100190,

J

Jiyou Jin

CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, Nanofabrication Laboratory, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology 2 , Beijing 100190,

L

Lianfeng Sun

Z

Zhaohe Dai