Multi-Moiré imaging based on femtosecond laser-fabricated microlens arrays

W Weirun Qin (State Key Laboratory for Manufacturing System Engineering and Shaanxi Key Laboratory of Photonics Technology for Information, School of Electronic Science and Engineering, Xi'an Jiaotong University , Xi'an 710049,) H Huacheng Xu M Mingyong Luo L Lin Kai (State Key Laboratory for Manufacturing System Engineering and Shaanxi Key Laboratory of Photonics Technology for Information, School of Electronic Science and Engineering, Xi'an Jiaotong University , Xi'an 710049,) W Wei Zhao G Guangqing Du (State Key Laboratory for Manufacturing System Engineering and Shaanxi Key Laboratory of Photonics Technology for Information, School of Electronic Science and Engineering, Xi'an Jiaotong University , Xi'an 710049,) F Feng Chen

Abstract

Moiré fringe imaging plays a pivotal role in high-precision measurement, anti-counterfeiting, microstructural analysis, and optical metrology. However, conventional Moiré imaging devices are typically limited to generating a single image pattern. Here, we introduce a novel multi-Moiré imaging device capable of producing images with multiple distinct patterns and varying depths of field. We first elucidate the underlying mechanisms for magnification and axial image distance in Moiré imaging, based on the fundamental principles of the Moiré phenomenon generated by the superposition of microlens arrays (MLAs) and micro-pattern arrays. MLAs with good surface morphology were then fabricated using femtosecond laser-assisted wet etching. Leveraging these imaging principles, multi-pattern and multi-depth-of-field Moiré imaging devices were successfully produced. Finally, imaging characterization of the fabricated devices confirmed their exceptional performance, demonstrating promising potential for future applications in precision measurement, anti-counterfeiting, and observation.

Article Details

Volume / Issue Vol. 129, Issue 2
Published July 13, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (7)

W

Weirun Qin

State Key Laboratory for Manufacturing System Engineering and Shaanxi Key Laboratory of Photonics Technology for Information, School of Electronic Science and Engineering, Xi'an Jiaotong University , Xi'an 710049,

H

Huacheng Xu

M

Mingyong Luo

L

Lin Kai

State Key Laboratory for Manufacturing System Engineering and Shaanxi Key Laboratory of Photonics Technology for Information, School of Electronic Science and Engineering, Xi'an Jiaotong University , Xi'an 710049,

W

Wei Zhao

G

Guangqing Du

State Key Laboratory for Manufacturing System Engineering and Shaanxi Key Laboratory of Photonics Technology for Information, School of Electronic Science and Engineering, Xi'an Jiaotong University , Xi'an 710049,

F

Feng Chen