Molecular beam epitaxy and characterization of wurtzite LaAlN

Abstract

We report the molecular beam epitaxy and structural characterization of single-phase wurtzite LaxAl1−xN thin films, with a La composition as high as x=0.20. In situ reflection high-energy electron diffraction confirms epitaxial film formation, and atomic force microscopy reveals sub-nanometer surface roughness for all compositions investigated. High-resolution x-ray diffraction and scanning transmission electron microscopy further confirm c-axis orientation, high crystalline quality, and precise in-plane epitaxial alignment. Importantly, atomic-resolution structural analysis demonstrates a continuous decrease in the c/a lattice-parameter ratio with increasing La content. In addition, out-of-plane piezoresponse force microscopy measurements show an enhanced effective d33, increasing from 5.00 pm/V for AlN to 7.66 pm/V for La0.20Al0.80N. These results establish LaAlN as a promising new wurtzite nitride alloy platform for future wide bandgap electronics, optoelectronics, and quantum photonics.