Microscopic origin of metal–insulator transition in two-dimensional Bi2O2Se unraveled by first-principles simulations

C Chen-Min Dai (Jiangsu Key Laboratory of Intelligent Optoelectronic Devices and Chips, School of Physical Science and Technology, Suzhou University of Science and Technology 1 , Suzhou 215009,) F Feifan Bian (Jiangsu Key Laboratory of Intelligent Optoelectronic Devices and Chips, School of Physical Science and Technology, Suzhou University of Science and Technology 1 , Suzhou 215009,) C Chunlan Ma (Jiangsu Key Laboratory of Intelligent Optoelectronic Devices and Chips, School of Physical Science and Technology, Suzhou University of Science and Technology 1 , Suzhou 215009,) M Menglin Huang (College of Integrated Circuits and Micro-Nano Electronics) Z Zenghua Cai S Shiyou Chen (Key Laboratory of Computational Physical Sciences (MOE), College of Integrated Circuits and Micro-Nano Electronics, Fudan University, Shanghai, China.)

Abstract

It has been experimentally observed that Bi2O2Se—a semiconductor with nominally metallic conductivity—can undergo a metal–insulator transition (MIT), yet its microscopic origin remains unclear. Our hybrid density functional theory study uncovers the mechanism behind this transition. Under O- and Se-poor growth conditions, donor defects VO+ and VSe+ form at the highest concentrations, pushing the Fermi level above the conduction band minimum (CBM) and inducing metallic behavior in Bi2O2Se. As the chemical potentials of O and Se increase to moderate levels, the concentrations of VO+ and VSe+ drop, shifting the Fermi level down to the CBM and triggering the MIT. Further enrichment in O and Se yields only a weakly insulating phase, because the densities of VO2+ and VSe2+ rise unexpectedly under these rich conditions, preventing the emergence of a highly insulating phase. This counterintuitive trend is explained by defect-correlation mechanism.

Article Details

Volume / Issue Vol. 127, Issue 26
Published December 29, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (6)

C

Chen-Min Dai

Jiangsu Key Laboratory of Intelligent Optoelectronic Devices and Chips, School of Physical Science and Technology, Suzhou University of Science and Technology 1 , Suzhou 215009,

F

Feifan Bian

Jiangsu Key Laboratory of Intelligent Optoelectronic Devices and Chips, School of Physical Science and Technology, Suzhou University of Science and Technology 1 , Suzhou 215009,

C

Chunlan Ma

Jiangsu Key Laboratory of Intelligent Optoelectronic Devices and Chips, School of Physical Science and Technology, Suzhou University of Science and Technology 1 , Suzhou 215009,

M

Menglin Huang

College of Integrated Circuits and Micro-Nano Electronics

Z

Zenghua Cai

S

Shiyou Chen

Key Laboratory of Computational Physical Sciences (MOE), College of Integrated Circuits and Micro-Nano Electronics, Fudan University, Shanghai, China.