Low-temperature growth of epitaxial BaTiO3 thin films with significant electro-optic coefficients

Y Yilin Cao (Department of Chemistry, The Scripps Research Institute, 10550 North Torrey Pines Road, La Jolla, California 92037, United States) Y Yiyang Wen (Institute of Modern Optics & Tianjin Key Laboratory of Micro-Scale Optical Information Science and Technology, Nankai University 3 , Tianjin 300071,) Y Yongtao Yang F Fan Zhang W Wenjia Zhang (Academy for Advanced Interdisciplinary Science and Technology, Beijing Key Laboratory for Advanced Energy Materials and Technologies, State Key Laboratory for Advanced Metals and Materials) J Jiangbing Du (State Key Laboratory of Advanced Optical Communication Systems and Networks, Shanghai Key Laboratory of Navigation and Location Services, Department of Electronic Engineering, Shanghai Jiao Tong University 4 , Shanghai 200240,) Y Yang Zhang Z Zhenping Wu (State Key Laboratory of Information Photonics and Optical Communications & School of Physical Science and Technology, Beijing University of Posts and Telecommunications 3 , Beijing 100876,) J Jian Wu

Abstract

Barium titanate (BaTiO3, BTO) thin films, with their exceptionally high Pockels coefficients, present a promising alternative to lithium niobate (LiNbO3, LN) for integrated photonic devices. BTO's compatibility with complementary metal–oxide–semiconductor (CMOS) technology further enhances its appeal, contingent on the development of low-temperature growth processes. This study investigates the impact of growth temperature on the electro-optic (EO) performance of BTO films, revealing a clear correlation between lower growth temperatures and reduced EO coefficients. Notably, BTO films grown at 400 °C maintain significant EO coefficients of approximately 51.6 pm/V. These findings underscore the potential of low-temperature grown BTO films for high-performance EO applications. By elucidating the relationship between growth temperature, crystallinity, and EO performance, this research provides critical guidelines for fabricating high-performing BTO films compatible with CMOS technology, facilitating the advancement of next-generation photonic devices.

Article Details

Volume / Issue Vol. 126, Issue 11
Published March 01, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (9)

Y

Yilin Cao

Department of Chemistry, The Scripps Research Institute, 10550 North Torrey Pines Road, La Jolla, California 92037, United States

Y

Yiyang Wen

Institute of Modern Optics & Tianjin Key Laboratory of Micro-Scale Optical Information Science and Technology, Nankai University 3 , Tianjin 300071,

Y

Yongtao Yang

F

Fan Zhang

W

Wenjia Zhang

Academy for Advanced Interdisciplinary Science and Technology, Beijing Key Laboratory for Advanced Energy Materials and Technologies, State Key Laboratory for Advanced Metals and Materials

J

Jiangbing Du

State Key Laboratory of Advanced Optical Communication Systems and Networks, Shanghai Key Laboratory of Navigation and Location Services, Department of Electronic Engineering, Shanghai Jiao Tong University 4 , Shanghai 200240,

Y

Yang Zhang

Z

Zhenping Wu

State Key Laboratory of Information Photonics and Optical Communications & School of Physical Science and Technology, Beijing University of Posts and Telecommunications 3 , Beijing 100876,

J

Jian Wu