Low-temperature electron dephasing rates indicate magnetic disorder in superconducting TiN films

A A. I. Lomakin (National University of Science and Technology MISIS 1 , Moscow,) E E. M. Baeva (Moscow Pedagogical State University 2 , Moscow,) N N. A. Titova (Moscow Pedagogical State University 2 , Moscow,) A A. V. Semenov (Moscow Pedagogical State University 2 , Moscow,) A A. V. Lubenchenko (National Research University MPEI 4 , Moscow,) M M. A. Kirsanova (Advanced Imaging Core Facility, Skolkovo Institute of Science and Technology 5 , Moscow,) S S. A. Evlashin S S. Saha S S. Bogdanov (Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign 8 , Urbana, Illinois 61801,) A A. I. Kolbatova (Moscow Pedagogical State University 2 , Moscow,) G G. N. Goltsman (Moscow Pedagogical State University 2 , Moscow,)

Abstract

We investigate electron transport and phase-breaking processes in thin titanium nitride (TiN) films of epitaxial quality. Previous studies show that a minute surface magnetic disorder significantly reduces the critical temperature (Tc) and broadens the superconducting transition as the film thickness and device size decrease. We measure electron dephasing rates via magnetoresistance from Tc to ∼4Tc in various-thickness TiN films. Electron dephasing occurs on the picosecond timescale and is nearly independent of temperature, differing from the expected inelastic scattering due to the electron–phonon and electron–electron interactions near Tc, which occur over a nanosecond timescale. We propose spin-flip scattering as a possible additional phase-breaking mechanism. The significant increase in the dephasing rate for the thinnest film indicates that magnetic disorder resides near the surface of naturally oxidized films. Our research suggests that magnetic disorder may be a significant contributor to RF dissipation in superconducting devices based on TiN.

Article Details

Volume / Issue Vol. 127, Issue 17
Published October 23, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (11)

A

A. I. Lomakin

National University of Science and Technology MISIS 1 , Moscow,

E

E. M. Baeva

Moscow Pedagogical State University 2 , Moscow,

N

N. A. Titova

Moscow Pedagogical State University 2 , Moscow,

A

A. V. Semenov

Moscow Pedagogical State University 2 , Moscow,

A

A. V. Lubenchenko

National Research University MPEI 4 , Moscow,

M

M. A. Kirsanova

Advanced Imaging Core Facility, Skolkovo Institute of Science and Technology 5 , Moscow,

S

S. A. Evlashin

S

S. Saha

S

S. Bogdanov

Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign 8 , Urbana, Illinois 61801,

A

A. I. Kolbatova

Moscow Pedagogical State University 2 , Moscow,

G

G. N. Goltsman

Moscow Pedagogical State University 2 , Moscow,