Low-loss Nb on Si superconducting resonators from a dual-use spintronics deposition chamber and with acid-free post-processing

M Maciej W. Olszewski (Department of Physics, Cornell University 1 , Ithaca, New York 14853,) J Jadrien T. Paustian (Department of Physics, Syracuse University 2 , Syracuse, New York 13244-1130,) T Tathagata Banerjee (School of Applied and Engineering Physics, Cornell University 3 , Ithaca, New York 14853,) H Haoran Lu (College of Chemistry, Key Laboratory of Theoretical & Computational Photochemistry of Ministry of Education) J Jorge L. Ramirez (Department of Physics, University of Colorado Boulder 4 , Boulder, Colorado 80309,) N Nhi Nguyen K Kiichi Okubo (Department of Physics, Syracuse University 2 , Syracuse, New York 13244-1130,) R Rohit Pant (Laboratory for Physical Sciences 6 , 8050 Greenmead Dr, College Park, Maryland 20740,) A Aleksandra B. Biedron (NY Creates 8 , Albany, New York 12203,) D Daniel C. Ralph C Christopher J. K. Richardson (Laboratory for Physical Sciences 6 , 8050 Greenmead Dr, College Park, Maryland 20740,) G Gregory D. Fuchs C Corey Rae H. McRae (Department of Physics, University of Colorado Boulder 4 , Boulder, Colorado 80309,) I Ivan V. Pechenezhskiy (Department of Physics, Syracuse University 2 , Syracuse, New York 13244-1130,) B B. L. T. Plourde (Department of Physics, Syracuse University 2 , Syracuse, New York 13244-1130,) V Valla Fatemi (School of Applied and Engineering Physics, Cornell University 3 , Ithaca, New York 14853,)

Abstract

Magnetic impurities are known to degrade superconductivity. For this reason, physical vapor deposition chambers that have previously been used for magnetic materials have generally been avoided for making high-quality superconducting resonator devices. In this article, we show by example that such chambers can be used for this purpose; with Nb films sputtered in a chamber that continues to be used for magnetic materials, we demonstrate compact (3 μm gap) coplanar waveguide resonators with low-power internal quality factors near one million. We achieve this using a resist strip bath with no post-fabrication acid treatment, which results in performance comparable to previous strip baths with acid treatments. We also find evidence that this improved resist strip bath provides a better surface chemical template for post-fabrication hydrogen fluoride processing. These results are consistent across three Si substrate preparation methods, including a 700 °C anneal. These results will inform nanofabrication for other superconducting materials and the integration of magnetic materials for hybrid systems.

Article Details

Volume / Issue Vol. 128, Issue 21
Published May 25, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (16)

M

Maciej W. Olszewski

Department of Physics, Cornell University 1 , Ithaca, New York 14853,

J

Jadrien T. Paustian

Department of Physics, Syracuse University 2 , Syracuse, New York 13244-1130,

T

Tathagata Banerjee

School of Applied and Engineering Physics, Cornell University 3 , Ithaca, New York 14853,

H

Haoran Lu

College of Chemistry, Key Laboratory of Theoretical & Computational Photochemistry of Ministry of Education

J

Jorge L. Ramirez

Department of Physics, University of Colorado Boulder 4 , Boulder, Colorado 80309,

N

Nhi Nguyen

K

Kiichi Okubo

Department of Physics, Syracuse University 2 , Syracuse, New York 13244-1130,

R

Rohit Pant

Laboratory for Physical Sciences 6 , 8050 Greenmead Dr, College Park, Maryland 20740,

A

Aleksandra B. Biedron

NY Creates 8 , Albany, New York 12203,

D

Daniel C. Ralph

C

Christopher J. K. Richardson

Laboratory for Physical Sciences 6 , 8050 Greenmead Dr, College Park, Maryland 20740,

G

Gregory D. Fuchs

C

Corey Rae H. McRae

Department of Physics, University of Colorado Boulder 4 , Boulder, Colorado 80309,

I

Ivan V. Pechenezhskiy

Department of Physics, Syracuse University 2 , Syracuse, New York 13244-1130,

B

B. L. T. Plourde

Department of Physics, Syracuse University 2 , Syracuse, New York 13244-1130,

V

Valla Fatemi

School of Applied and Engineering Physics, Cornell University 3 , Ithaca, New York 14853,