Lattice-matched (Al <i>x</i> Sc <i>y</i> Ga1− <i>x</i> − <i>y</i> )2O3/ <b> <i>β</i> </b> -Ga2O3 heterostructures with widely tunable bandgap

K Kazuki Koreishi (Department of Chemical Science and Engineering, Institute of Science Tokyo 1 , Ookayama, Meguro, Tokyo 152-8552,) K Kodai Niitsu (Center for Basic Research on Materials, National Institute for Materials Science 2 , Sengen, Tsukuba, Ibaraki 305-0047,) T Takuto Soma (Department of Chemical Science and Engineering, Institute of Science Tokyo 1 , Ookayama, Meguro, Tokyo 152-8552,) K Kohei Yoshimatsu (Department of Chemical Science and Engineering, Institute of Science Tokyo 1 , Ookayama, Meguro, Tokyo 152-8552,) A Akira Ohtomo (Department of Chemical Science and Engineering, Institute of Science Tokyo 1 , Ookayama, Meguro, Tokyo 152-8552,)

Abstract

Bandgap engineering of β-Ga2O3 is essential for advancing its electronic and optoelectronic applications. However, the growth of high-quality heteroepitaxial structures is often hampered by large lattice mismatches. In this study, we design (AlxScyGa1−x−y)2O3 quaternary alloys in the form of both polycrystalline powders and heteroepitaxial films and demonstrate their lattice matching to β-Ga2O3. Powder x-ray diffraction (XRD) measurements reveal that the lattice parameters of monoclinic (AlxScyGa0.8)2O3 match those of β-Ga2O3 when x/y = 1.5–3.2. (AlxScyGa1−x−y)2O3 thin films are grown on β-Ga2O3 (100) substrates by pulsed-laser deposition by varying the composition ratio x/y and the total substitutional fraction x + y. Nearly perfect lattice-matched epilayers with uniform composition and crystal structure are obtained up to x + y ∼ 0.6, as confirmed by XRD and scanning transmission electron microscopy. Electron energy loss spectroscopy reveals a tunable bandgap from 4.5 to 5.8 eV. These results demonstrate that (AlxScyGa1−x−y)2O3/β-Ga2O3 heterostructures are promising platforms for ultrawide-bandgap semiconductor devices.

Article Details

Volume / Issue Vol. 129, Issue 1
Published July 06, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (5)

K

Kazuki Koreishi

Department of Chemical Science and Engineering, Institute of Science Tokyo 1 , Ookayama, Meguro, Tokyo 152-8552,

K

Kodai Niitsu

Center for Basic Research on Materials, National Institute for Materials Science 2 , Sengen, Tsukuba, Ibaraki 305-0047,

T

Takuto Soma

Department of Chemical Science and Engineering, Institute of Science Tokyo 1 , Ookayama, Meguro, Tokyo 152-8552,

K

Kohei Yoshimatsu

Department of Chemical Science and Engineering, Institute of Science Tokyo 1 , Ookayama, Meguro, Tokyo 152-8552,

A

Akira Ohtomo

Department of Chemical Science and Engineering, Institute of Science Tokyo 1 , Ookayama, Meguro, Tokyo 152-8552,