Kevlar-based laser-induced graphene memristors and its relevant applications

Y Yifan Zhu (Materials Genome Institute, State Key Laboratory of Advanced Refractories) K Kejian Chen G Genzhong Guan (Shanghai Key Lab of Modern Optical System, Engineering Research Center of Optical Instrument and System, Ministry of Education, University of Shanghai for Science and Technology , 516 Jungong Rd., Shanghai 200093,) Y Yuke Qin X Xiaofen Zeng Q Qian Wang

Abstract

Memristors, as key devices for compute-in-memory, are increasingly explored for flexible and wearable applications. The one-step fabrication of Al/laser-induced graphene (LIG)/Al memristor with flexibility and artificial synapse functionality on Kevlar through laser-induced technology has been demonstrated in this paper. The Kevlar-based LIG memristor features multi-level resistance switching, reproducible resistive switching over the measured 270 cycles, and a relatively large ON/OFF ratio of about 70, higher than that of some previously reported polyimide-based LIG memristors. In addition, the Kevlar-based LIG memristor demonstrates synaptic functions, including paired-pulse inhibition, dynamic synaptic response, and long-term potentiation/depression. The device still exhibits distinguishable resistive switching characteristics after 100 days under plastic encapsulation. Furthermore, by integrating the memristor with an LIG pressure sensor, an adjustable-threshold sensory response is realized. These results suggest the Kevlar-based LIG memristor as a multifunctional device that not only integrates resistive switching, synaptic functionality, and threshold sensing but also retains distinguishable switching characteristics under the tested storage conditions, making it attractive for intelligent protective clothing and flexible electronics.

Article Details

Volume / Issue Vol. 128, Issue 22
Published June 01, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (6)

Y

Yifan Zhu

Materials Genome Institute, State Key Laboratory of Advanced Refractories

K

Kejian Chen

G

Genzhong Guan

Shanghai Key Lab of Modern Optical System, Engineering Research Center of Optical Instrument and System, Ministry of Education, University of Shanghai for Science and Technology , 516 Jungong Rd., Shanghai 200093,

Y

Yuke Qin

X

Xiaofen Zeng

Q

Qian Wang