Irradiation driven magnetism enhancement in Y-doped HfO2 films

W Wenqin Xie (Department of Physics, North China University of Technology 1 , Beijing 100144,) J Jinbao Yang (Department of Physics, North China University of Technology 1 , Beijing 100144,) S Sixia Hu Y Yuan Yang J Jianqiang Yu X Xiaoyun Tie (Department of Physics, North China University of Technology 1 , Beijing 100144,) Y Yanwei An (Department of Physics, North China University of Technology 1 , Beijing 100144,) L Le Zhong L Liang Xie (Translational Immunology Institute, Singhealth/Duke-National University of Singapore, Academic Medical Centre, The Academia) H Haoliang Huang D Dechao Meng

Abstract

HfO2-based ferroelectric films are regarded as core materials for next-generation nonvolatile memories and spintronics owing to their CMOS compatibility and exceptional ferroelectricity. Yet, the minute energy differences between polymorphs and the intricate defect–structure coupling have impeded precise, quantitative control of their ferroelectric and magnetic properties. Here, we introduce a non-equilibrium γ-ray irradiation strategy to modulate the magnetic response of 7% Y-doped epitaxial HfO2 thin films. Correlated structural, spectroscopic, and magnetic analyses reveal a nonlinear correlation between oxygen vacancies and lattice distortions. At an intermediate dose of 260 Gy, cooperative compressive strain and engineered vacancies boost out-of-plane saturation magnetization by 480%. Conversely, at 4800 Gy, excessive defect accumulation drives structural degradation and suppresses magnetism. X-ray diffraction, x-ray photoelectron spectroscopy, and scanning transmission electron microscopy jointly track the evolution of defect and lattice structure, elucidating a dose-dependent crossover from defect-driven magnetism enhancement to quenching governed by competitive defect–structure interactions. The work establishes a dose-defect-magnetism framework and provides a route toward magneto-electric cooperative control of wide-bandgap oxides for spintronic applications.

Article Details

Volume / Issue Vol. 128, Issue 10
Published March 09, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (11)

W

Wenqin Xie

Department of Physics, North China University of Technology 1 , Beijing 100144,

J

Jinbao Yang

Department of Physics, North China University of Technology 1 , Beijing 100144,

S

Sixia Hu

Y

Yuan Yang

J

Jianqiang Yu

X

Xiaoyun Tie

Department of Physics, North China University of Technology 1 , Beijing 100144,

Y

Yanwei An

Department of Physics, North China University of Technology 1 , Beijing 100144,

L

Le Zhong

L

Liang Xie

Translational Immunology Institute, Singhealth/Duke-National University of Singapore, Academic Medical Centre, The Academia

H

Haoliang Huang

D

Dechao Meng