Investigation on the structural and electronic property of monoclinic Al2O3/β-Ga2O3 superlattice with varying layer periods

J Jiahe Cao (College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications 1 , Nanjing 210023,) Y Yan Wang C Chuang Zhang (Key Laboratory of Photochemistry, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry) G Guofeng Hu (Function Hub, Hong Kong University of Science and Technology (Guangzhou) 2 , Nansha, Guangzhou 511466,) W Weihua Tang G Guosong Zeng D Daniela Gogova (Department of Physics, Chemistry and Biology (IFM), Linköping University 4 , Linköping 581 83,) C Chee-Keong Tan (College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications 1 , Nanjing 210023,)

Abstract

In this study, we employ first-principles calculations to explore the structural and electronic properties of monoclinic Al2O3/Ga2O3 superlattices with varied layer thickness and to perform a comparative analysis with (AlxGa1−x)2O3 alloys. Our investigation examines the lattice constants and electronic energy bandgaps of both the superlattice structures and alloys across different Al concentrations, shedding light on the intricate relationship between composition and electronic properties. The analysis on electronic properties reveals that as the number of Al2O3 monolayers in the Al2O3/Ga2O3 superlattice rises from 2 to 6 monolayers, the bandgap correspondingly expands from 5.29 to 6.43 eV. The band alignment between monoclinic Al2O3 and Ga2O3 exhibits a type-II band alignment. The conduction and valence band offsets between the bulk material and Al2O3/Ga2O3 superlattice varies with change in the number of Al2O3 monolayers. Our study gives a deeper insight into the properties of the Al2O3/Ga2O3 superlattice and suggests a solution to the Al-phase separation issue in (AlxGa1−x)2O3 alloys for advanced semiconductor device applications.

Article Details

Volume / Issue Vol. 126, Issue 11
Published March 01, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (8)

J

Jiahe Cao

College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications 1 , Nanjing 210023,

Y

Yan Wang

C

Chuang Zhang

Key Laboratory of Photochemistry, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry

G

Guofeng Hu

Function Hub, Hong Kong University of Science and Technology (Guangzhou) 2 , Nansha, Guangzhou 511466,

W

Weihua Tang

G

Guosong Zeng

D

Daniela Gogova

Department of Physics, Chemistry and Biology (IFM), Linköping University 4 , Linköping 581 83,

C

Chee-Keong Tan

College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications 1 , Nanjing 210023,