Investigation of the RF performance degradation in GaN HEMTs associated with the kink effect
Abstract
This work comprehensively investigates the RF performance degradation in GaN high-electron-mobility transistors associated with the kink effect. A pulsed kink amplitude modulated method is proposed to quantitatively correlate kink amplitude with RF S-parameter degradation. Experimental results show that a 25% increase in kink amplitude corresponds to an 18.6% drop in intrinsic transconductance (gm) and a 10.9% decrease in cutoff frequency (fT) at VGS = −2 V and VDS = 10 V. Long-term large-signal measurements after 60 h RF stress reveal an 8.99% increase in kink amplitude, accompanied by 1.7 dB gain degradation and an 8% reduction in power-added efficiency. Furthermore, a pulse-aware trap occupancy large-signal model is developed, embedding a pulse-conditioned trap occupancy variable (N) to simultaneously govern kink amplitude and inflection voltage (VDSkink). The proposed model achieves good agreement with the measured data, including I–V, S-parameters, and large-signal characteristics, and successfully predicts RF metric degradation associated with kink amplitude variation.
Article Details
Journal Info
Applied Physics Letters
American Institute of Physics
Authors (10)
Qingyang Dong
Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,
Boqin Niu
Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,
Xiangcong Zhai
Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,
Bilal Shabbir
Tianyu Li
Tao You
Hangzhou Institute of Advanced Studies, Zhejiang Normal University , 1108 Gengwen Road, Hangzhou, Zhejiang 311231,
Yankui Li
Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,
Ke Wei
The Key Laboratory of Biomedical Information Engineering of Ministry of Education, School of Life Science and Technology, Xi’an Jiaotong University, No. 28 West Xianning Road, Xi’an 710049, People’s Republic of China
Xinyu Liu
Weijun Luo
Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,