Investigation of the RF performance degradation in GaN HEMTs associated with the kink effect

Q Qingyang Dong (Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,) B Boqin Niu (Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,) X Xiangcong Zhai (Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,) B Bilal Shabbir T Tianyu Li T Tao You (Hangzhou Institute of Advanced Studies, Zhejiang Normal University , 1108 Gengwen Road, Hangzhou, Zhejiang 311231,) Y Yankui Li (Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,) K Ke Wei (The Key Laboratory of Biomedical Information Engineering of Ministry of Education, School of Life Science and Technology, Xi’an Jiaotong University, No. 28 West Xianning Road, Xi’an 710049, People’s Republic of China) X Xinyu Liu W Weijun Luo (Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,)

Abstract

This work comprehensively investigates the RF performance degradation in GaN high-electron-mobility transistors associated with the kink effect. A pulsed kink amplitude modulated method is proposed to quantitatively correlate kink amplitude with RF S-parameter degradation. Experimental results show that a 25% increase in kink amplitude corresponds to an 18.6% drop in intrinsic transconductance (gm) and a 10.9% decrease in cutoff frequency (fT) at VGS = −2 V and VDS = 10 V. Long-term large-signal measurements after 60 h RF stress reveal an 8.99% increase in kink amplitude, accompanied by 1.7 dB gain degradation and an 8% reduction in power-added efficiency. Furthermore, a pulse-aware trap occupancy large-signal model is developed, embedding a pulse-conditioned trap occupancy variable (N) to simultaneously govern kink amplitude and inflection voltage (VDSkink). The proposed model achieves good agreement with the measured data, including I–V, S-parameters, and large-signal characteristics, and successfully predicts RF metric degradation associated with kink amplitude variation.

Article Details

Volume / Issue Vol. 128, Issue 12
Published March 23, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (10)

Q

Qingyang Dong

Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,

B

Boqin Niu

Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,

X

Xiangcong Zhai

Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,

B

Bilal Shabbir

T

Tianyu Li

T

Tao You

Hangzhou Institute of Advanced Studies, Zhejiang Normal University , 1108 Gengwen Road, Hangzhou, Zhejiang 311231,

Y

Yankui Li

Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,

K

Ke Wei

The Key Laboratory of Biomedical Information Engineering of Ministry of Education, School of Life Science and Technology, Xi’an Jiaotong University, No. 28 West Xianning Road, Xi’an 710049, People’s Republic of China

X

Xinyu Liu

W

Weijun Luo

Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029,