Investigation of backward switching and write margin optimization of SOT-MTJ devices

Y Yi Xu C Chao Wang Y Yinuo Shi (State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,) X Xin Cao Z Zhou Li (School of Materials Science and Engineering) D Dinggui Zeng (Zhejiang Hikstor Technology Co., Ltd 2 ., Hangzhou 311305, Zhejiang,) Z Zhenghui Ji (Zhejiang Hikstor Technology Co., Ltd 2 ., Hangzhou 311305, Zhejiang,) Y Yaoyu Gu (State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,) M Mengxi Wang (State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,) Y Yongda Chen (State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,) T Tianjin Wu (State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,) Z Zichao Rong (State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,) G Guchang Han (State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,) B Bo Liu

Abstract

Spin–orbit-torque magnetic random access memory (SOT-MRAM) offers superior advantages compared to conventional spin-transfer-torque MRAM. However, it suffers from backward switching, which severely constrains the write current window, presenting critical challenges for commercialization. Here, we investigate this phenomenon in full SOT-magnetic tunnel junction structures fabricated on 300 mm wafers. Experiments and numerical simulations demonstrate that Joule heating and field-like torque are the primary factors that dominate the backward switching phenomenon. Based on these insights, the write margin is enhanced by optimizing the SOT layer thickness, pulse width engineering, and stray field optimizations. Our findings establish thermal management as a primary design consideration for scalable SOT-MRAM arrays.

Article Details

Volume / Issue Vol. 128, Issue 12
Published March 23, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (14)

Y

Yi Xu

C

Chao Wang

Y

Yinuo Shi

State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,

X

Xin Cao

Z

Zhou Li

School of Materials Science and Engineering

D

Dinggui Zeng

Zhejiang Hikstor Technology Co., Ltd 2 ., Hangzhou 311305, Zhejiang,

Z

Zhenghui Ji

Zhejiang Hikstor Technology Co., Ltd 2 ., Hangzhou 311305, Zhejiang,

Y

Yaoyu Gu

State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,

M

Mengxi Wang

State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,

Y

Yongda Chen

State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,

T

Tianjin Wu

State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,

Z

Zichao Rong

State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,

G

Guchang Han

State Key Laboratory of Spintronic Devices and Technologies 1 , Hangzhou 311300, Zhejiang,

B

Bo Liu