Investigation and modeling of subthreshold turn-on voltage in bulk and FDSOI MOSFETs at cryogenic temperatures

Z Zhizhao Ma S Shilong Li J Jiarui Ma (Department of Chemistry) Y Yuxuan Zhou Y Yuefeng Chen (CAS Key Laboratory of Quantum Information, University of Science and Technology of China 2 , Hefei,) J Jinfeng Li (State Key Laboratory of Multiphase Flow in Power Engineering) C Chao Luo (University of Miami , , , ,) L Longyang Lin Y Yida Li K Kai Chen Q Quan Chen (State Key Laboratory of Polymer Science and Technology, Changchun Institute of Applied Chemistry)

Abstract

Conventional physics-based MOSFET models miss the sharp subthreshold turn-on “knee” in the logarithmic dependence of the Id on the Vgs that emerges in MOSFETs at cryogenic temperatures. This oversight results in a fundamental mischaracterization of the MOSFETs' turn-on behavior, compromising the physical accuracy of Cryo-complementary metal–oxide–semiconductor compact models. To address this gap, we define the subthreshold turn-on voltage Vsub,on as the Vgs where Id begins its exponential rise from the leakage floor. Our physics-based model links Vsub,on to the filling of localized band tail states, accurately predicting its temperature dependence and is validated against 40 nm bulk and 22 nm FDSOI data from 300 K down to 4 K, providing a key parameter and framework to enable reliable cryogenic circuit design.

Article Details

Volume / Issue Vol. 127, Issue 17
Published October 23, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (11)

Z

Zhizhao Ma

S

Shilong Li

J

Jiarui Ma

Department of Chemistry

Y

Yuxuan Zhou

Y

Yuefeng Chen

CAS Key Laboratory of Quantum Information, University of Science and Technology of China 2 , Hefei,

J

Jinfeng Li

State Key Laboratory of Multiphase Flow in Power Engineering

C

Chao Luo

University of Miami , , , ,

L

Longyang Lin

Y

Yida Li

K

Kai Chen

Q

Quan Chen

State Key Laboratory of Polymer Science and Technology, Changchun Institute of Applied Chemistry