Intrinsic layer Hall effect with half-quantization in PT-broken magnetic topological insulators

D Di Han Y Yu Zhang (Xiangya Hospital, Central South University Changsha China) Y Yuanzheng Chu (College of Physics and Hebei Advanced Thin Film Laboratory, Hebei Normal University , Shijiazhuang, Hebei 050024,) H Hao Tian (Shanghai Research Institute of Petrochemical Technology) X Xuqi Li S Shifei Qi (College of Physics and Hebei Advanced Thin Film Laboratory, Hebei Normal University , Shijiazhuang, Hebei 050024,)

Abstract

The layer Hall effect (LHE) in antiferromagnetic topological systems originates from layer-locked Berry curvature, which gives rise to opposite Hall responses associated on different layers. Experimentally, in PT-symmetric even-layer MnBi2Te4, a perpendicular electric field is usually required to observe a layer-polarized anomalous Hall conductance. In principle, antiferromagnetic topological materials with intrinsic structural asymmetry provide a relatively simple route to revealing the LHE without external field control. Using first-principles calculations and a tight-binding model, we show that the intrinsic antiferromagnetic topological material MnBi4Te7, which lacks PT-symmetry protection, gives rise to an intrinsic LHE with a half-quantized plateau at σxy=±0.5e2/h, whereas MnBi6Te10 also exhibits a layer-polarized anomalous Hall conductance, although the half-quantized value is not realized. The tight-binding results are in good agreement with the first-principles calculations. Since MnBi4Te7 has been widely synthesized and characterized in experiments, this study provides an optimal platform for exploring the intrinsic LHE with half-quantization without external electric field.

Article Details

Volume / Issue Vol. 129, Issue 4
Published July 27, 2026
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (6)

D

Di Han

Y

Yu Zhang

Xiangya Hospital, Central South University Changsha China

Y

Yuanzheng Chu

College of Physics and Hebei Advanced Thin Film Laboratory, Hebei Normal University , Shijiazhuang, Hebei 050024,

H

Hao Tian

Shanghai Research Institute of Petrochemical Technology

X

Xuqi Li

S

Shifei Qi

College of Physics and Hebei Advanced Thin Film Laboratory, Hebei Normal University , Shijiazhuang, Hebei 050024,