Indium alloying in <b> <i>ε</i> </b>-Ga2O3 for polarization and interfacial charge tuning

Y Yan Wang Y Yizhang Guan (Function Hub, Hong Kong University of Science and Technology (Guangzhou) 2 , Nansha, Guangzhou 511466,) C Chuang Zhang (Key Laboratory of Photochemistry, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry) J Jiahe Cao (College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications 1 , Nanjing 210023,) X Xuanyan Chen Q Qiangqiang Ouyang (Third Affiliated Hospital of Sun Yat-sen University, Sun Yat-sen University 2 , Guangzhou 510630,) Y Yew Hoong Wong (Centre of Advanced Materials, Department of Mechanical Engineering, Faculty of Engineering, University of Malaya 4 , 50603 Kuala Lumpur,) G Guofeng Hu (Function Hub, Hong Kong University of Science and Technology (Guangzhou) 2 , Nansha, Guangzhou 511466,) C Chee Keong Tan

Abstract

Density functional theory was utilized to assess the influence of In alloying on the spontaneous (Psp) and piezoelectric (Ppe) polarization of ε-Ga2O3 heterostructures with In concentrations ranging from 0% to 50%. The analysis demonstrated a decrease in both Psp and Ppe with an increase in In concentration, described by the equations Psp = −9.5947x + 24.81 and Ppe = −0.6217x (where x represents the In concentration, with units in μC/cm2). Additionally, the polarization-induced two-dimensional electron gas (2DEG) density within ε-InGaO/ε-Ga2O3 heterostructures was examined using a one-dimensional Schrödinger–Poisson solver. An inverse correlation was observed between 2DEG density and epitaxial thickness across all undoped In-alloyed samples. Furthermore, achieving high 2DEG densities (exceeding 1013 cm−2) is significantly facilitated by n-type doping concentrations above 1017 cm−3 in ε-InGaO. These insights not only augment the understanding of polarization effects in ε-Ga2O3 heterostructures but also provide a strategic framework for enhancing 2DEG density in ε-Ga2O3-based devices, which offers significant potential for advancing ε-Ga2O3-based high electron mobility transistors for power and RF applications.

Article Details

Volume / Issue Vol. 126, Issue 2
Published January 13, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (9)

Y

Yan Wang

Y

Yizhang Guan

Function Hub, Hong Kong University of Science and Technology (Guangzhou) 2 , Nansha, Guangzhou 511466,

C

Chuang Zhang

Key Laboratory of Photochemistry, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry

J

Jiahe Cao

College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications 1 , Nanjing 210023,

X

Xuanyan Chen

Q

Qiangqiang Ouyang

Third Affiliated Hospital of Sun Yat-sen University, Sun Yat-sen University 2 , Guangzhou 510630,

Y

Yew Hoong Wong

Centre of Advanced Materials, Department of Mechanical Engineering, Faculty of Engineering, University of Malaya 4 , 50603 Kuala Lumpur,

G

Guofeng Hu

Function Hub, Hong Kong University of Science and Technology (Guangzhou) 2 , Nansha, Guangzhou 511466,

C

Chee Keong Tan