In2O3 gap states in amorphous and poly-crystalline phases: Band tail and defect level characterization by subgap photocurrent spectroscopy

S Shota Nunomura (Core Electronics Technology Research Institute, National Institute of Advanced Industrial Science and Technology 1 , 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568,) C Chia-Tsong Chen (Semiconductor Frontier Research Center, National Institute of Advanced Industrial Science and Technology 2 , 16-1 Onogawa, Tsukuba, Ibaraki 305-8569,) H Hitoshi Tampo (Research Institute for Energy Efficient Technologies, National Institute of Advanced Industrial Science and Technology 3 , 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568,) T Tatsuro Maeda (Semiconductor Frontier Research Center, National Institute of Advanced Industrial Science and Technology 2 , 16-1 Onogawa, Tsukuba, Ibaraki 305-8569,)

Abstract

A nanometer-thick indium oxide (In2O3) layer is studied in terms of gap states, by means of subgap photocurrent spectroscopy. The In2O3 layer is prepared by atomic layer deposition, where its nanostructure is changed from an amorphous to poly-crystalline phase, via changing the layer thickness. Two groups of gap states are distinguished: shallow and deep levels, reflecting the valence band (VB) tail and a specific type of defects, respectively. The VB tail is clearly broadened for the amorphous phase, where the broadening is characterized by the Urbach energy, e.g., 326 ±30 meV. The deep-level defect states are recognized at ≈ 2.3 eV from the conduction band edge, with a distribution of ≲110 meV. Interestingly, the energy level and distribution are not strongly changed, regardless of an amorphous or poly-crystalline structure.

Article Details

Volume / Issue Vol. 127, Issue 18
Published November 03, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (4)

S

Shota Nunomura

Core Electronics Technology Research Institute, National Institute of Advanced Industrial Science and Technology 1 , 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568,

C

Chia-Tsong Chen

Semiconductor Frontier Research Center, National Institute of Advanced Industrial Science and Technology 2 , 16-1 Onogawa, Tsukuba, Ibaraki 305-8569,

H

Hitoshi Tampo

Research Institute for Energy Efficient Technologies, National Institute of Advanced Industrial Science and Technology 3 , 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568,

T

Tatsuro Maeda

Semiconductor Frontier Research Center, National Institute of Advanced Industrial Science and Technology 2 , 16-1 Onogawa, Tsukuba, Ibaraki 305-8569,