Impact of cavity tuning on lasing characteristics for GaN-based vertical-cavity surface-emitting lasers
Abstract
We demonstrated that cavity tuning—i.e., the alignment of a resonance wavelength relative to a distributed Bragg reflector (DBR) center wavelength—is a key factor influencing the laser characteristics of GaN-based vertical-cavity surface-emitting lasers (VCSELs) with AlInN/GaN DBRs. By utilizing in-plane cavity tuning variation across our VCSEL wafer, the effective mirror loss was monotonically increased from 25 to 50 cm−1, resulting in corresponding changes in differential external quantum efficiency, threshold current density, and wall plug efficiency (WPE). The in-plane cavity tuning variation was effectively utilized to extract the internal parameters and identify an optimal mirror loss for high WPE in our GaN-based VCSELs. As a result, an internal loss of 11 ± 6 cm−1, an injection efficiency of 85% ± 10%, and an optimal mirror loss around 40 cm−1, achieving a WPE over 25%, were obtained.
Article Details
Journal Info
Applied Physics Letters
American Institute of Physics
Authors (10)
Naoki Shibahara
Department of Materials Science and Engineering, Meijo University 1 , 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502,
Shoki Arakawa
Department of Materials Science and Engineering, Meijo University 1 , 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502,
Atsunori Tokushi
Department of Materials Science and Engineering, Meijo University 1 , 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502,
Taiki Kitamura
Department of Materials Science and Engineering, Meijo University 1 , 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502,
Taichi Nishikawa
Department of Materials Science and Engineering, Meijo University 1 , 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502,
Ruka Watanabe
Department of Materials Science and Engineering, Meijo University 1 , 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502,
Satoshi Kamiyama
Department of Materials Science and Engineering, Meijo University 1 , Nagoya 468-8502,
Motoaki Iwaya
Department of Materials Science and Engineering, Meijo University 1 , Nagoya 468-8502,
Toshihiro Kamei
Semiconductor Frontier Research Center (SFRC), National Institute of Advanced Industrial Science and Technology (AIST) 2 , 16-1 Onogawa, Tsukuba, Ibaraki 305-8569,
Tetsuya Takeuchi
Department of Materials Science and Engineering, Meijo University 1 , Nagoya 468-8502,