High-performance type-I Sn-doped-Ga2O3/SnSe2 heterojunction photodetectors enabled by Fowler–Nordheim tunneling

Z Zibin Huang (School of Electronic Science and Engineering (School of Microelectronics), Guangdong Province Key Lab of Chip and Integration Technology, South China Normal University 2 , Guangzhou 510631,) Z Zhenfeng Zhang Y Yanan Wang X Xun Yang (School of Chemistry and Chemical Engineering Guangxi Colleges and Universities Key Laboratory of Applied Chemistry Technology and Resource Development Guangxi University Nanning Guangxi P. R. China) S Shan Huang Y Yifan Zhang H Hanzhe Zhang M Man Hoi Wong (SEMATECH 2 , Albany, New York 12203,) Z Zhuangfei Zhang S Shichen Su (School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Guangdong Province Key Lab of Chip and Integration Technology 1 , Foshan 528225,)

Abstract

Gallium oxide (Ga2O3) is renowned for its exceptional physical and chemical properties, making it an ideal material for solar-blind photodetectors. In this study, Sn-doped-Ga2O3 microwires (MWs) were utilized to fabricate a type-I heterojunction photodetector with SnSe2. The Sn-doped-Ga2O3 MW/SnSe2 hybrid van der Waals heterojunction exhibits both direct tunneling and Fowler–Nordheim tunneling under positive voltages. By exploiting the Fowler–Nordheim tunneling mechanism at a 6 V bias, the device demonstrates outstanding performance under 254 nm illumination, achieving a rectification ratio of 104–105, an ultralow dark current of 0.11 pA, a responsivity of 81.82 A/W, a detectivity of 7.79 × 1014 Jones, and an exceptionally high external quantum efficiency of 4 × 104%. These impressive characteristics make the heterojunction photodetector highly suitable for high-quality imaging applications. This research offers a promising processing solution for Ga2O3-based optoelectronic devices, further extending their potential for versatile solar-blind detection and imaging applications.

Article Details

Volume / Issue Vol. 127, Issue 6
Published August 11, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (10)

Z

Zibin Huang

School of Electronic Science and Engineering (School of Microelectronics), Guangdong Province Key Lab of Chip and Integration Technology, South China Normal University 2 , Guangzhou 510631,

Z

Zhenfeng Zhang

Y

Yanan Wang

X

Xun Yang

School of Chemistry and Chemical Engineering Guangxi Colleges and Universities Key Laboratory of Applied Chemistry Technology and Resource Development Guangxi University Nanning Guangxi P. R. China

S

Shan Huang

Y

Yifan Zhang

H

Hanzhe Zhang

M

Man Hoi Wong

SEMATECH 2 , Albany, New York 12203,

Z

Zhuangfei Zhang

S

Shichen Su

School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Guangdong Province Key Lab of Chip and Integration Technology 1 , Foshan 528225,