Gate leakage mechanisms caused by 60Co gamma irradiation on p-GaN gate AlGaN/GaN HEMTs

D Danmei Lin (State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , Xi'an 710071,) X Xuefeng Zheng (State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, National Engineering Research Center of Wide Band-gap Semiconductor, School of Microelectronics, Xidian University 2 , Xi'an 710071,) S Shaozhong Yue (Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,) X Xiaohu Wang (School of Advanced Materials) H Hao Zhang R Rui Han T Tian Zhu (School of Materials Science and Engineering Changzhou University Changzhou P. R. China) L Ling Lv (State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering) Y Yingzhe Wang T Tan Wang (School of Materials Science and Engineering Tongji University Shanghai 201804 P.R. China) X Xiaohua Ma Y Yue Hao

Abstract

This study investigates the impact of 60Co γ-ray irradiation on the gate leakage mechanism of Schottky-type p-GaN gate AlGaN/GaN HEMTs. Devices with breakdown voltage of 650 V were irradiated with 60Co γ-ray at a gate bias of VG_stress = 7 V. A significant increase in the forward gate current was observed with increasing irradiation dose. To analyze the gate leakage mechanisms before and after irradiation, temperature-dependent current–voltage (IG–VG) measurements and capacitance deep-level transient spectroscopy were performed. The results indicate that under reverse gate bias, the leakage mechanism consistently remains trap-assisted tunneling (TAT) both before and after irradiation. However, under forward gate bias, the dominant conduction mechanism shifts from Poole–Frenkel emission to TAT as a result of the introduction of hole traps with an energy level of EV + 0.93 eV.

Article Details

Volume / Issue Vol. 127, Issue 11
Published September 15, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (12)

D

Danmei Lin

State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University 1 , Xi'an 710071,

X

Xuefeng Zheng

State Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, National Engineering Research Center of Wide Band-gap Semiconductor, School of Microelectronics, Xidian University 2 , Xi'an 710071,

S

Shaozhong Yue

Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,

X

Xiaohu Wang

School of Advanced Materials

H

Hao Zhang

R

Rui Han

T

Tian Zhu

School of Materials Science and Engineering Changzhou University Changzhou P. R. China

L

Ling Lv

State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering

Y

Yingzhe Wang

T

Tan Wang

School of Materials Science and Engineering Tongji University Shanghai 201804 P.R. China

X

Xiaohua Ma

Y

Yue Hao