Gain-saturated 69.8 nm neon-like argon laser pumped by capillary discharge at a high main-pulse current of 19 kA
Abstract
Extreme ultraviolet (EUV) lasers based on capillary discharge offer a compact and efficient short-wavelength source; yet, compared with the 46.9 nm laser well-established in practical applications, achieving high gain at 69.8 nm in neon-like argon ions (Ar8+) remains challenging. Instead of relying on capillary length extension, saturation was achieved by optimizing plasma conditions through enhanced energy injection in a 35 cm capillary. Increasing the discharge current to 19 kA yielded a record gain coefficient of 0.47 cm−1, the highest value reported to date for a 69.8 nm laser. This enabled saturation at an active length of 32 cm with a gain-length product of 15, reaching a maximum of 16.5 at 35 cm. Further increasing the current to 24 kA causes the laser intensity and gain to decrease markedly, with the gain coefficient reduced to 0.25 cm−1 and no saturation observed. In addition, by spectrally isolating the 69.8 nm laser with a self-made monochromator, this work achieves the measurement of the 69.8 nm laser pulse width under high main current. One-dimensional magnetohydrodynamic (MHD) simulations show that the higher main-pulse current produces intensified Joule heating and a faster pinch, leading to excessive electron density and overionization near the implosion point. This suppresses the Ar8+ density required for population inversion and limits the achievable gain. These combined experimental and computational results clarify the role of main-pulse current in affecting plasma state for 69.8 nm lasing and guide for optimizing discharge-waveform parameters in capillary-based EUV laser sources.
Article Details
Journal Info
Applied Physics Letters
American Institute of Physics
Authors (5)
Bo An
Yongpeng Zhao
Dongdi Zhao
National Key Laboratory of Laser Spatial Information, Harbin Institute of Technology , Harbin 150006,
Yunsong Bai
National Key Laboratory of Laser Spatial Information, Harbin Institute of Technology , Harbin 150006,
Huaiyu Cui
National Key Laboratory of Laser Spatial Information, Harbin Institute of Technology , Harbin 150006,