Flexible tuning of asymmetric near-field radiative thermal transistor by utilizing distinct phase-change materials

H Hexiang Zhang (Department of Mechanical and Industrial Engineering, Northeastern University 1 , Boston, Massachusetts 02115,) X Xuguang Zhang F Fangqi Chen (Department of Mechanical Engineering, University of Michigan 2 , Ann Arbor, Michigan 48109,) M Mauro Antezza (Laboratoire Charles Coulomb (L2C), UMR 5221 CNRS-Université de Montpellier 3 , F-34095 Montpellier,) Y Yi Zheng

Abstract

Phase-change materials (PCMs) play a pivotal role in the development of advanced thermal devices due to their reversible phase transitions, which drastically modify their thermal and optical properties. In this study, we present an effective dynamic thermal transistor with an asymmetric design that employs distinct PCMs, vanadium dioxide (VO2), and germanium antimony telluride (GST), on either side of the gate terminal, which is the center of the control unit of the near-field thermal transistor. This asymmetry introduces unique thermal modulation capabilities, taking control of thermal radiation in the near-field regime. VO2 transitions from an insulating to a metallic state, while GST undergoes a reversible switch between amorphous and crystalline phases, each inducing substantial changes in thermal transport properties. By strategically combining these materials, the transistor exhibits enhanced functionality, dynamically switching between states of absorbing and releasing heat by tuning the temperature of gate. This gate terminal not only enables active and efficient thermal management but also provides effective opportunities for manipulating heat flow in radiative thermal circuits. Our findings highlight the potential of such asymmetrically structured thermal transistors in advancing applications across microelectronics, high-speed data processing, and sustainable energy systems, where precise and responsive thermal control is critical for performance and efficiency.

Article Details

Volume / Issue Vol. 126, Issue 9
Published March 01, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (5)

H

Hexiang Zhang

Department of Mechanical and Industrial Engineering, Northeastern University 1 , Boston, Massachusetts 02115,

X

Xuguang Zhang

F

Fangqi Chen

Department of Mechanical Engineering, University of Michigan 2 , Ann Arbor, Michigan 48109,

M

Mauro Antezza

Laboratoire Charles Coulomb (L2C), UMR 5221 CNRS-Université de Montpellier 3 , F-34095 Montpellier,

Y

Yi Zheng