Ferroelectric control of valleytronic nonvolatile storage in HfCl2/Sc2CO2 heterostructure

Z Zhou Cui (Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University 1 , Fuzhou 350108,) X Xunkai Duan J Jiansen Wen Z Ziye Zhu (Eastern Institute for Advanced Study, Eastern Institute of Technology 2 , Ningbo, Zhejiang 315200,) J Jiayong Zhang J Jiajie Pei (Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University 1 , Fuzhou 350108,) C Cuilian Wen (Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University 1 , Fuzhou 350108,) T Tong Zhou B Bo Wu B Baisheng Sa

Abstract

Valleytronics, utilizing the valley degree of freedom in electrons, has potential for advancing the next-generation nonvolatile storage. However, practical implementation remains challenging due to the limited control over valleytronic properties. Here, we propose ferroelectric HfCl2/Sc2CO2 van der Waals heterostructure as a platform to overcome these limitations, enabling tunable and nonvolatile valleytronic behaviors. Our findings show that the electric polarization state of the Sc2CO2 monolayer governs the electronic properties of heterostructures. Positive polarization induces a direct gap at the valleys, enabling valleytronic functionality for excitation and readout via circularly polarized light, while negative polarization results in an indirect-gap, suppressing valleytronic behavior. Moreover, our transport simulations further demonstrate a polarization-dependent ferroelectric p-i-n junction with 8 nm possesses a maximum tunnel electroresistance (TER) ratio of 1.60 × 108% at a bias of 0.5 eV. These results provide insights into ferroelectric-controlled valleytronic transitions and position the HfCl2/Sc2CO2 heterostructure as a promising candidate for energy-efficient valleytronic memory and nonvolatile storage applications.

Article Details

Volume / Issue Vol. 126, Issue 12
Published March 01, 2025
ISSN 0003-6951
Publisher American Institute of Physics

Journal Info

Applied Physics Letters

American Institute of Physics

ISSN: 0003-6951 Physical Sciences

Authors (10)

Z

Zhou Cui

Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University 1 , Fuzhou 350108,

X

Xunkai Duan

J

Jiansen Wen

Z

Ziye Zhu

Eastern Institute for Advanced Study, Eastern Institute of Technology 2 , Ningbo, Zhejiang 315200,

J

Jiayong Zhang

J

Jiajie Pei

Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University 1 , Fuzhou 350108,

C

Cuilian Wen

Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University 1 , Fuzhou 350108,

T

Tong Zhou

B

Bo Wu

B

Baisheng Sa